Etching device and etching method for any apodised fiber bragg grating
A technology of optical fiber grating and writing device, which is applied in the direction of photolithography exposure device, diffraction grating, microlithography exposure equipment, etc., can solve the problems of non-universality, achieve good repeatability and flexibility, and simple structure , easy-to-achieve effects
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[0034] The present invention will be further described below in conjunction with embodiment, but should not limit protection scope of the present invention with this.
[0035] figure 1 It is a structural block diagram of an arbitrary apodized fiber grating writing device of the present invention. Also a block diagram of an embodiment of the apparatus. As can be seen from the figure, the arbitrary apodized fiber grating writing device of the present invention is characterized in that its composition includes:
[0036] Laser 1, a rectangular aperture 2 is placed at the output end of the laser 1, a programmable spatial light modulator 3, a cylindrical mirror 5, and a phase mask fixture are placed in sequence behind the rectangular aperture, and the phase mask 6 is fixed on the In the draw-in slot of the phase mask clamp and keep it horizontal, 2 sets of optical fiber clamps are arranged behind the phase mask 6, and the phase mask clamp and 2 sets of optical fiber clamps are res...
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