Graphene preparation method without substrate transferring

A substrate transfer and graphene technology, which is applied in the synthesis of graphene and nanomaterials, can solve problems such as complex preparation process, pollution, and graphene structure damage, and achieve the effect of simplifying the process steps

Inactive Publication Date: 2012-08-15
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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Problems solved by technology

[0007] In view of the above-mentioned shortcoming of prior art, the object of the present invention is to provide a kind of method for preparing graphene without substrate transfer, for solving complex preparation process in the prior art, need substrate transfer and in substrate transfer Problems causing damage and contamination of the graphene structure

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  • Graphene preparation method without substrate transferring
  • Graphene preparation method without substrate transferring

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Embodiment Construction

[0032] The embodiments of the present invention are described below through specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and various details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0033] see figure 1 , Figure 2a to Figure 2b ,as well as Figure 3 to Figure 4 . It should be noted that the diagrams provided in this embodiment are only to illustrate the basic concept of the present invention in a schematic way, and the drawings only show the components related to the present invention rather than the number, shape and number of components in actual implementation. For dimension drawing, the type, quantity and proport...

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Abstract

The invention provides a graphene preparation method without substrate transferring. According to the graphene preparation method, a catalytic metal layer is deposited on a substrate; then, carbon ions are injected into the catalytic metal layer to form a carbon-atom-saturated face by using an ion implantation technology, and the carbon-atom-saturated face can be located at a position close to the substrate and a catalytic metal layer interface through controlling injected energy; then, the substrate is subjected to high-temperature annealing, carbon-atom layers, i.e. graphene films, are precipitated on the catalytic metal layer and a substrate interface; and finally, the catalytic metal layer is removed, and thus the graphene films are prepared on the substrate. The graphene preparation method without the substrate transferring has the advantages that the processing steps for preparing graphene are simplified, the graphene can be directly prepared on any substrate without transferring, the damage and the pollution to the structure of the graphene cannot be accordingly caused, and the graphene with high quality can be directly applied to a desired substrate, so that the preparation method can faster promote the wide application of the graphene in different fields.

Description

technical field [0001] The invention relates to a method for preparing graphene, in particular to a method for preparing graphene without substrate transfer, and belongs to the technical field of graphene synthesis and nanomaterials. Background technique [0002] In 2004, Andre Geim and Kostya Novoselov, professors of physics at the University of Manchester in the United Kingdom, successfully used a very simple method of micromechanical peeling (Micromechanical Cleavage). The graphite layer was exfoliated, and a free and stable single-crystal layer of graphite sheets was observed. This two-dimensional ordered carbon material that can exist alone is called graphene by scientists. The pair were also awarded the 2010 Nobel Prize in Physics for their pioneering research in the field of graphene. Carrier mobility in graphene is as high as 2 × 105 cm 2 ·V -1 , whose mobility is much higher than that of silicon materials used on a large scale in the semiconductor industry, and i...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B31/04C01B32/184
Inventor 狄增峰王刚张苗陈达丁古巧谢晓明
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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