Method for manufacturing large-sized high-density chromium target

A manufacturing method and compact technology, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of lack of preparation process, etc., and achieve the effect of simplifying the process, avoiding stress release, and eliminating internal stress

Active Publication Date: 2012-09-19
YANTAI SHUODE NEW MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for the preparation of large-scale high-density chromium tar

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0032] Specific embodiment 1:

[0033] A method for manufacturing a large high-density chromium target includes the following steps:

[0034] Ⅰ. Vacuum degassing

[0035] Chromium powder with -200 mesh, purity of 99.95% and oxygen content less than 1000ppm is used as raw material. First press 5MPa to ensure that the powder will not overflow in a large amount during the vacuuming process, and the vacuum degree is maintained at 10 -3 In a Pa environment, fill with argon gas, and raise the temperature to 800°C at a rate of 300°C / h.

[0036] Ⅱ. Stage heating and boosting

[0037] In order to ensure that the flow and bonding of the chromium material are carried out in an orderly stage during the high-temperature sintering process, the hot pressing process uses a multi-stage heating and pressure method to complete the sintering. Pressurize to 10MPa, then heat to 1100°C at a heating rate of 200°C / h, and keep it for 1 hour to ensure uniform temperature distribution in the mold cavity. Finall...

Example Embodiment

[0050] Specific embodiment 2:

[0051] A method for manufacturing a large high-density chromium target includes the following steps:

[0052] Ⅰ. Vacuum degassing

[0053] Chromium powder with -200 mesh, purity of 99.95% and oxygen content less than 1000ppm is used as raw material. First press 5MPa to ensure that the powder will not overflow in a large amount during the vacuuming process, and the vacuum degree is maintained at 10 -3 In a Pa environment, heat to 800°C at a heating rate of 300°C / h and keep it for 1 hour to reduce the molecular gas in the powder.

[0054] Ⅱ. Stage heating and boosting

[0055] Pressurize to 10MPa, then heat to 1100°C at a heating rate of 200°C / h, and keep it for 1 hour to ensure uniform temperature distribution in the mold cavity. Finally, it is heated to 1400°C at a heating rate of 100°C / h, kept for 1 hour, and the pressure is increased by 2 MPa every 50°C during the temperature rise, and the final pressure is 20 MPa.

[0056] Ⅲ. Pressure-holding furnace...

Example Embodiment

[0068] Specific embodiment 3:

[0069] A method for manufacturing a large high-density chromium target includes the following steps:

[0070] Ⅰ. Vacuum degassing

[0071] Chromium powder with -200 mesh, purity of 99.95% and oxygen content less than 1000ppm is used as raw material. First press 5MPa to ensure that the powder will not overflow in a large amount during the vacuuming process, and the vacuum degree is maintained at 10 -3 In a Pa environment, heat to 800°C at a heating rate of 300°C / h and keep it for 1 hour to reduce the molecular gas in the powder.

[0072] Ⅱ. Stage heating and boosting

[0073] In order to ensure that the flow and bonding of the chromium material are carried out in an orderly stage during the high-temperature sintering process, the hot pressing process uses a multi-stage heating and pressure method to complete the sintering. Pressurize to 10MPa, then heat to 1400°C at a heating rate of 200°C / h, keep it for 1 hour, increase the pressure by 2MPa every 50°C ...

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Abstract

The invention relates to a hot pressing method of a high-density chromium target. The method comprises the following seven sequential steps: vacuumizing, staged temperature and pressure increasing, pressure preserving furnace cooling, hot forging, annealing, hot rolling and machining. Through rationally designed process steps, stable technical parameters are selected so that the purpose of manufacturing the large-sized high-density chromium target at low cost is achieved.

Description

technical field [0001] The invention belongs to the technical field of new materials, and in particular relates to a method for manufacturing a chromium target. Background technique [0002] Metal chrome (Cr) is a slightly bluish silvery-white metal. Chromium has a strong passivation ability in the atmosphere and can maintain luster for a long time. Chromium has good corrosion resistance to various acids and strong alkalis, and has good chemical stability. Chromium also has the characteristics of high hardness and high resistivity. Due to the various properties of chromium, chromium and its alloys or compound films prepared by various surface technologies are widely used in surface engineering, such as: mechanical functional film, microelectronic film, electromagnetic functional film, optical film, decorative function membrane etc. With the development of high-tech, high-purity chromium sputtering targets with different performance and requirements need to be used in the ...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/14B22F3/16
Inventor 王广欣钟小亮豆帆
Owner YANTAI SHUODE NEW MATERIAL
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