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Multi-layer reflecting mirror and lithographic device

A mirror, reflecting wavelength technology, applied in microlithography exposure equipment, optics, application of diffraction/refraction/reflection for processing, etc., can solve problems such as interface sharpness decline

Active Publication Date: 2012-10-17
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This implantation can lead to a decrease in the sharpness of the interface between the La and B (boron) layers

Method used

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  • Multi-layer reflecting mirror and lithographic device
  • Multi-layer reflecting mirror and lithographic device
  • Multi-layer reflecting mirror and lithographic device

Examples

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Embodiment Construction

[0038] figure 1 A lithographic apparatus according to one embodiment of the invention is schematically shown. The apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. EUV radiation); a patterning device support device or support structure (e.g. a mask table) MT configured to support the patterning device (such as a mask or a reticle) MA, and is connected to a first positioning device PM configured to precisely position the patterning device MA; a substrate table (such as a wafer table) WT configured to hold a substrate (such as a coating A resist-coated wafer) W connected to a second positioning device PW configured to precisely position the substrate; and a projection system (such as a reflective projection lens system) PS configured to The pattern imparted to the radiation beam B is projected onto a target portion C of the substrate W (eg, comprising one or more dies).

[0039] Illumination system IL may include vari...

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Abstract

The invention discloses a multi-layer reflecting mirror and a lithographic device. The multi-layer reflecting mirror is configured to reflect radiation whose wavelength is within the range of approximately 6.4nm-7.2nm. The multi-layer reflecting mirror has an alternating layer having a first layer and a second layer. The first and second layers are selected from the following groups: uranium or uranium compound or uranium nitride and a B4C layer; thorium or thorium compound or thorium nitride and the B4C layer; lanthanum or lanthanum compound or lanthanum nitride and a B9C layer; lanthanum or lanthanum compound or lanthanum nitride and the B4C layer; uranium or uranium compound or uranium nitride and the B9C layer; thorium or thorium compound or thorium nitride and the B9C layer; lanthanum or lanthanum compound or lanthanum nitride and a boron layer; uranium or uranium compound or uranium nitride and the boron layer; carbon or carbon compound or carbon nitride and the boron layer; thorium or thorium compound or thorium nitride and the boron layer.

Description

technical field [0001] The present invention relates to a multilayer mirror and a lithographic apparatus comprising such a multilayer mirror. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. Photolithographic equipment can be used, for example, in IC manufacturing processes. In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, transfer of the pattern is accomplished by imaging the pattern onto a layer of radiation sensitive material (resist) disposed on the substrate. Typically, a single substrate will include a network of adjacent target portions that are successively patterned. [0003] Photolitho...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G21K1/06G03F1/24
CPCG21K1/062G02B5/0891G03F1/24G21K2201/061B82Y10/00B82Y40/00C03C17/3642C03C17/3663
Inventor A·M·雅库尼恩
Owner ASML NETHERLANDS BV
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