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Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

A technology of resin composition and actinic ray, applied in photosensitive materials for photomechanical equipment, optics, organic chemistry, etc.

Active Publication Date: 2012-10-17
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, for this composition, there is still room for further improvement

Method used

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  • Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
  • Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
  • Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0832]

[0833] Synthesis of sulfonium salts by Friedel-Crafts reaction between 2-phenylpropyl acetate and diphenylsulfoxide. Then, the salt was hydrolyzed to obtain the compound (B-1-1) shown below.

[0834] In a 200 ml three-necked flask, 3.7 g of Compound (B-1-1) was dissolved in a mixed solvent consisting of 1.5 g of pyridine and 25 g of THF. While cooling the solution in an ice bath with stirring, 2.1 g of chloroacetyl chloride was added dropwise to the solution over 30 minutes. After the dropwise addition was complete, the ice bath was removed and the mixture was allowed to warm to room temperature and the mixture was stirred at this temperature for 1 hour. Then, 100 g of chloroform was added to the mixture, and the obtained organic phase was washed with water, a saturated sodium bicarbonate solution and water in this order. The solvent was removed to obtain a brown liquid compound (B-1-2) shown below.

[0835] In a 200ml three-necked flask, the obtained compound (B...

Embodiment 2

[0839]

[0840] The following compound (B-1-5) was obtained by Friedel-Crafts reaction between 3-phenyl-1-methylpropylamine and diphenylsulfoxide.

[0841] In a 200 ml three-necked flask, 4.2 g of compound (B-1-5) was dissolved in 40 g of acetonitrile. Then, 3.6 g of potassium carbonate was added to the solution, and while cooling the mixture in an ice bath, 3.2 g of ethyl bromoacetate was added dropwise to the solution over 30 minutes. Subsequently, the mixture was stirred for 30 minutes in an ice bath. The ice bath was removed, then allowed to warm to room temperature and the mixture was stirred at this temperature for 5 hours. Then 100 g of chloroform was added to the mixture, and the obtained organic phase was washed with water. The solvent was removed to obtain a brown liquid compound (B-1-6) shown below.

[0842] Compound (B-1-6) was dissolved in 50 g of water, 2.9 g of potassium nonafluorobutanesulfonate was added to the aqueous solution, and stirred for 30 minutes...

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Abstract

Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.

Description

[0001] Cross References to Related Applications [0002] This application is based upon and claims the benefit of priority from prior Japanese Patent Application No. 2010-288726 filed on December 24, 2010 and Prior Japanese Patent Application No. 2011-187711 filed on August 30, 2011, and is incorporated by reference Combine its entirety here. technical field [0003] The present invention relates to an actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the composition, and a method of forming a pattern using the composition. More specifically, the present invention relates to a composition used in a semiconductor manufacturing process such as an IC, a liquid crystal circuit board manufacturing process, a thermal head, etc., or other photoprocessing lithography processes, and to a film formed from the composition and the use of the composition method of forming patterns. In particular, the present i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/039H01L21/027
CPCG03F7/2041G03F7/0397G03F7/0045G03F7/0046C07C381/12G03F7/11
Inventor 松田知树涩谷明规德川叶子山口修平藤田光宏
Owner FUJIFILM CORP
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