High-precision five-axis ion beam machining device with high dynamic performance and control method thereof

Abstract

The invention discloses a high-precision five-axis ion beam machining device with high dynamic performance and a control method thereof. The high-precision five-axis ion beam machining device with high dynamic performance comprises a digital control system, a machine frame component, an X-axis linear motion component, a Y-axis linear motion component, a Z-axis linear motion component, an A-axis direct driving component, a B-axis direct driving component, a workpiece conveying component and an ion source; and the accurate movement of the ion source is realized through the driving action in five directions. The control method comprises the following steps: when the machining along the normal direction of an optical mirror surface is carried out, the pose position of an optical mirror surface point in the coordinate system of a workpiece is converted into a coordinate point in the coordinate system of a machine tool through rotational transformation, the equal target range machining along the normal direction is carried out, and the motion pose position of each axis of the machine tool is calculated; and S-type speed machining mode is then adopted, and the speed of each axis of the machine tool at each working point is calculated. The invention has the advantages that the motion is stable, the rigidity is good, the precision is high, and the dynamic performance is high.

Description

technical field [0001] The invention mainly relates to the field of ion beam processing, in particular to a five-axis ion beam processing device with high precision and high dynamic performance and a control method thereof. Background technique [0002] "Ion beam modification process" is the physical sputtering effect that occurs when the ion beam emitted by the ion source bombards the optical mirror in a vacuum environment, so as to achieve the purpose of removing the surface material of the optical element. It has the advantages of atomic-level processing accuracy, no edge effect, stable removal function, and fast surface shape convergence, which makes ion beam modification an effective method for high-precision optical mirror processing, especially lithography objective lens processing. [0003] In a specific application, if the exposure wavelength of extreme ultraviolet lithography is 13.5nm, the accuracy requirement assigned to a single component will reach 0.1nm, and i...

AI Technical Summary

Problems solved by technology

When processing aspheric lithography objective lenses, each processing point will have inconsistent removal functions due to steepness changes, and the accuracy of the modification cannot be guaranteed

Therefore, in the existing ion beam modification, the realization of dwell time on the machine tool generally adopts the trapezoidal speed machining mode, which can shorten the acceleration and deceleration time, but

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