Reflection-type lithography aligning device based on moire fringe

Abstract

The invention discloses a reflection-type lithography aligning device based on moire fringe, adopting a reflection-type optical system which is suitable for approaching a contact-type lithography alignment. The device comprises an aligning lighting system, a half-reflecting semi-permeable mirror, a mask plate, a mask grating mark, a silicon chip grating mark, a silicon chip, a displacement workpiece bench, a fringe receiving system and a computer, wherein the aligning lighting system aims at parallel lights to be incident on the half-reflecting semi-permeable mirror at an angle of 45 degrees, the half-reflecting semi-permeable mirror diffracts the grating mark which aims at the parallel lights and reflects onto the mask plate, the diffraction lights continues spreading the grating mark which are incident onto the silicon chip and diffracts to overlap the mask grating mark onto the silicon chip grating mark, the reflected light continues spreading through the half-reflecting semi-permeable mirror, a fringe imaging system receives the aligning fringe images, the displacement relationship of the mask plate and the silicon chip is obtained by using the computer to analyze the images, and the displacement relationship is timely fed back to the displacement workpiece bench to realize the alignment of the direction x and the direction y.

Description

technical field [0001] The invention belongs to the technical field of proximity contact photolithography, and in particular relates to a reflective photolithography alignment device based on moiré fringes. Background technique [0002] The research and development of photolithography technology plays an extremely important role in the manufacture of integrated circuit technology, and the shrinking feature size promotes the continuous improvement of resolution. In addition, as the basis of nanotechnology, the manufacture of nano-devices is inseparable from high-resolution lithography. As the main processing method of optical components, optical micro-nano processing technology has promoted the rapid development of nanotechnology. [0003] The next-generation lithography technology, such as extreme ultraviolet lithography, electron beam lithography, ion beam lithography, X-ray lithography, nanoimprint lithography, etc., has become a research hotspot in international and dome...

AI Technical Summary

Problems solved by technology

As a result, the accuracy of traditional alignment methods has been difficult to adapt to the gradually improved lithographic resolution

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