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Negative photosensitive resin composition, protective film and touch panel member using same

A technology of touch panel components and photosensitive resins, applied in optical elements, photosensitive materials for optomechanical equipment, optics, etc., can solve problems such as moisture and heat resistance, and achieve excellent moisture and heat resistance, high transparency, pattern Excellent workability

Active Publication Date: 2015-11-25
TORAY IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But it has problems in moisture and heat resistance

Method used

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  • Negative photosensitive resin composition, protective film and touch panel member using same
  • Negative photosensitive resin composition, protective film and touch panel member using same
  • Negative photosensitive resin composition, protective film and touch panel member using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0108] Hereinafter, the present invention will be described using examples thereof, but the aspects of the present invention are not limited to these examples.

Synthetic example 1

[0109] (Synthesis example 1: Synthesis of polysiloxane solution (i))

[0110] Put 47.67g (0.35mol) methyltrimethoxysilane, 39.66g (0.20mol) phenyltrimethoxysilane, 26.23g (0.10mol) 3-trimethoxysilylpropyl succinic acid into a 500mL three-necked flask , 82.04g (0.35mol) γ-acryloylpropyltrimethoxysilane, 185.08g diacetone alcohol (hereinafter referred to as DAA), immersed in an oil bath at 40°C, stirring with a dropping funnel for 10 minutes A phosphoric acid aqueous solution obtained by dissolving 0.391 g of phosphoric acid (0.2% by weight relative to the charged monomer) in 55.8 g of water was added. After stirring at 40° C. for 1 hour, the temperature of the oil bath was set at 70° C., stirred for 1 hour, and then the temperature of the oil bath was raised to 115° C. over 30 minutes. One hour after the start of heating, the internal temperature of the solution reached 100° C., and heating and stirring was started for 2 hours therefrom (internal temperature: 100 to 110° C.). ...

Synthetic example 2

[0111] (Synthesis Example 2: Synthesis of Polysiloxane Solution (ii))

[0112] Put 54.48g (0.40mol) methyltrimethoxysilane, 39.66g (0.20mol) phenyltrimethoxysilane, 13.12g (0.05mol) 3-trimethoxysilylpropyl succinic acid into a 500mL three-necked flask , 82.04g (0.35mol) γ-acryloylpropyltrimethoxysilane, 174.74g of DAA, soaked in an oil bath at 40°C, and added 0.379g of phosphoric acid ( Aqueous phosphoric acid solution obtained by dissolving 0.2% by weight with respect to the charged monomer in 54.9 g of water. Next, heating and stirring were carried out under the same conditions as in Synthesis Example 1. As a result, a total of 110 g of methanol and water were distilled as by-products. DAA was added to the obtained DAA solution of polysiloxane so that the polymer concentration would be 40% by weight to obtain a polysiloxane solution (ii). When the weight average molecular weight (Mw) of the obtained polymer was measured by GPC, it was 6000 (polystyrene conversion). The ca...

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Abstract

Provided is a negative photosensitive resin composition which comprises: (A) an alkali-soluble resin having a carboxylic acid equivalent between 200 g / mol and 1,400 g / mol; (B) a photopolymerization initiator; (C) a polyfunctional monomer; and (D) a zirconium compound. It is possible to provide a negative photosensitive resin composition which has excellent patternability, high UV cured hardness and thermosetting hardness, and high transparency, which provides a cured film having excellent moisture resistance, and which is capable of alkali development.

Description

Technical field [0001] The invention involves a negative photosensitive resin composition, a protective film using the composition, and touch panel components. Background technique [0002] At present, the purpose of hard coating materials involves many fields, such as the surface hardness of containers, sheets, film, discs, thin monitors, etc. used to improve car components, cosmetics, etc.As the characteristics of hard coating materials, in addition to hardness and wipe resistance, it can also be used as an example of heat resistance, weather resistance, adhesion, etc. [0003] Existing technical literature [0004] Patent literature [0005] As a representative example of the hard coating material, the UV curing hard coating with a free radical polymer (such as referring to non -patented literature 1), which is composed of: low polymer and single parts containing aggregate groups, Optimum agent and other additives.Low polymers and monomers perform free radical aggregation unde...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G02B1/14G03F7/038G03F7/075G02B1/10
CPCG02B1/11G02B1/10G02B5/20G02B5/22G03F7/0047G03F7/032G03F7/033G03F7/0388G03F7/0757
Inventor 荒木齐诹访充史冈泽彻
Owner TORAY IND INC
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