Resin composition and cured film obtained therefrom

A technology of resin composition and cured film, applied in radiation control device, surface pretreatment, device for coating liquid on surface, etc. Effects of low refractive index, excellent pattern workability, and excellent coatability

Pending Publication Date: 2021-02-12
TORAY IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in these materials, in order to obtain a low refractive index, a large amount of addition of a fluorine-containing siloxane compound, particle addition of silica nanoparticles, hollow silica, etc. are implemented, and the addition of a large amount of a fluorine-containing siloxane compound is difficult. In other words, it is unavoidable to reduce chemical resistance and heat resistance. For particle addition, when processing in a pattern, it is unavoidable to avoid fine unevenness on the surface and edges.

Method used

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  • Resin composition and cured film obtained therefrom
  • Resin composition and cured film obtained therefrom
  • Resin composition and cured film obtained therefrom

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0143] Hereinafter, although an Example is given and this invention is demonstrated more concretely, this invention is not limited to these Examples. Compounds using abbreviations among compounds used in Synthesis Examples and Examples are shown below.

[0144] PGMEA: Propylene Glycol Monomethyl Ether Acetate

[0145] CPN: Cyclopentanone

[0146] gBL: γ-butyrolactone

[0147] BzOH: benzyl alcohol

[0148] BzME: benzyl methyl ether

[0149] MBz: methyl benzoate

[0150] MTMS: Methyltrimethoxysilane

[0151] PhTMS: Phenyltrimethoxysilane

[0152] TES: Tetraethoxysilane

[0153] HfTMS: 4-(2-Hydroxy-1,1,1,3,3,3-hexafluoroisopropyl)-1-triethoxysilylbenzene

[0154] CFTMS: Trifluoropropyltrimethoxysilane.

[0155]

[0156] conduct 29 In the measurement of Si-NMR, the proportion corresponding to the integral value of each organosilane was calculated from the integral value of the whole, and the ratio was calculated. The sample (liquid) was poured into the NMR sample tube...

Synthetic example 3

[0176] Synthesis Example 3 Synthesis of polysiloxane (P-1)

[0177] Put MTMS 109.25g (0.565mol), HfTMS (Hf-1) 84.67g (0.049mol), TES 6.51g (0.014mol), PGMEA 191.75g ​​into a 500ml three-necked flask, and stir at room temperature for 30 minutes The phosphoric acid aqueous solution which melt|dissolved 1.00g (0.50 mass % with respect to the input monomer) of phosphoric acid in water 56.82g was added. Then, after immersing the flask in a 70°C oil bath and stirring for 90 minutes, the oil bath was heated up to 115°C over 30 minutes. The internal temperature of the solution reached 100°C 1 hour after the start of the temperature rise, and then heating and stirring was performed for 2 hours (internal temperature: 100 to 110°C) to obtain polysiloxane (P-1). In addition, nitrogen gas was circulated at 0.05 liter (liter) / min during temperature raising and heating stirring. A total of 154.41 g of methanol and water were distilled out as by-products during the reaction. The solid cont...

Synthetic example 4

[0178] Synthesis of Synthesis Example 4 Polysiloxane (P-2)

[0179] By the same steps as in Synthesis Example 1, MTMS 112.22g (0.551mol), HfTMS (Hf-1) 66.97g (0.037mol), TES 22.88g (0.048mol), PGMEA185.62g were added, and phosphoric acid 1.01g (relatively The phosphoric acid aqueous solution which melt|dissolved in 61.30g of water (0.50 mass %) in the input monomer, and polysiloxane (P-2) was obtained. The solid content concentration of the obtained polysiloxane (P-2) was 42.8 mass %. pass 29 In the measurement of Si-NMR, the structure represented by any one of the general formulas (1) to (3) and the structure represented by any one of the general formulas (4) or (5) are in (A) polysiloxane The molar amounts of are 15mol%, 10mol%, respectively.

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Abstract

Provided is a resin composition which has a low refractive index, is excellent in terms of heat resistance, chemical resistance, and applicability, and has excellent patternability. The resin composition comprises (A) a polysiloxane and (B) a solvent, and is characterized in that the polysiloxane (A) includes a structure represented by any of specific general formulae (1) to (3) and a structure represented by either of specific general formulae (4) and (5).

Description

technical field [0001] The present invention relates to a resin composition, its cured film, and a solid-state imaging element, an organic EL element, and a display device including the same. Background technique [0002] In recent years, liquid crystal displays, organic EL televisions, and the like have achieved narrower borders and thinner profiles by using LED light sources and the like to introduce light from the side. In particular, recently, with respect to liquid crystal displays, transparent liquid crystal displays are being vigorously researched and developed by various companies as new display devices. At this time, in order to efficiently guide the light incident from the side in a certain direction, it is required to have a low refractive index, high transparency, excellent chemical resistance to chemicals used in the processing process, and no yellowing during the heating process. A new material with good heat resistance such as deterioration. As a highly tran...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L83/04B05D3/02B05D7/24C08G77/24C08K3/36C08K5/28
CPCB05D3/02B05D7/24C08G77/24C08K3/36C08K5/28C08L83/04C08L83/08C08G77/16C08G77/18H01L27/146
Inventor 日比野利保的羽良典诹访充史藤井真实
Owner TORAY IND INC
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