Film ablation sensor and manufacturing method thereof

A sensor and thin film technology, applied in the field of thin film ablation sensor and its preparation based on micromachining technology, thin film ablation sensor and its preparation, can solve the problems of complex production process of ablation sensor and low reliability level of sensor, etc. Achieve the effects of improving consistency, improving processing efficiency and reducing manufacturing costs

Active Publication Date: 2013-01-16
48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide a thin-film ablation sensor and its preparation method for the defects of complex production process and low reliability level of the ablation sensor in the prior art. The production process of the sensor is simple and mature, and it has good anti-environmental interference Capability and Reliability Levels

Method used

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  • Film ablation sensor and manufacturing method thereof
  • Film ablation sensor and manufacturing method thereof
  • Film ablation sensor and manufacturing method thereof

Examples

Experimental program
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Embodiment 1

[0035] See Figure 1 to Figure 5 , The thin-film ablation sensor 1 includes a substrate 2, a transition layer 3 provided on the substrate 2, and an ablation resistor 4 provided on the transition layer 3; a protective film 6 is provided on the ablation resistor 4; The corrosion resistance 4 is a resistance sequence composed of more than two resistances; the resistance includes a wire bonding panel 5; the wire bonding panel 5 is connected to the adapter plate 13 through a wire 10; the base 2 is provided with a height Adjustment hole 9;

[0036] Wherein, the material of the substrate 2 is Al 2 O 3 , The diameter is 50mm~150mm, the thickness is 0.5mm~1mm; the material of the transition layer 3 is Ta 2 O 5 , The thickness is 0.05μm~0.1μm; the material of the ablation resistor 4 is Au, and the thickness is 0.2μm~0.5μm; the material of the protective film 6 is SiO 2 , The thickness is 0.1μm~0.2μm. The height adjustment hole 9 is a 1.6mm×10mm through hole. The interval between the multi...

Embodiment 2

[0038] (1) For Al with a diameter of 50mm~150mm and a thickness of 0.5mm~1mm 2 O 3 The substrate 2 is cleaned to remove the oil and impurities on the polished surface of the substrate;

[0039] (2) Use ion beam sputtering to deposit Ta with a thickness of 0.05μm~0.1μm 2 O 5 The transition film 3 is used to enhance the bonding force between the Au film layer and the base layer 2;

[0040] (3) The Au film layer with a thickness of 0.2μm~0.5μm deposited by ion beam sputtering is the ablation material layer 14;

[0041] (4) Use photolithography process to make and ablate resistive photoresist mask layer on Au film. Use iodine and potassium iodide etching solution to etch the Au film to remove the unnecessary area of ​​Au film to form Au film ablation Resistance 4 and lead welding area 5;

[0042] (5) Use photolithography process to make photoresist mask layer to protect the lead welding area;

[0043] (6) Ion beam sputtering deposits SiO with a thickness of 0.1μm~0.2μm 2 Protective film 6,...

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Abstract

The invention discloses a film ablation sensor and a manufacturing method thereof. The film ablation sensor comprises a base, a transitional layer arranged on the base and an ablation resistor arranged on the transitional layer, wherein the ablation resistor comprises a lead bonding pad region; the lead bonding pad region is connected with an adapter plate through a lead wire; a protection film is arranged on the ablation resistor; and a height adjusting hole is formed in the base. The film ablation sensor is prepared by adopting a micromachining technology. The manufacturing process for the film ablation sensor is simple and can meet different measurement precision requirements.

Description

technical field [0001] The invention belongs to the technical field of ablation sensors, and in particular relates to a thin-film ablation sensor based on micromachining technology and a preparation method thereof. More specifically, the present invention relates to a thin-film ablation sensor and a preparation method thereof. The measurement of the ablation rate of the heat insulating layer is realized through the thin-film resistance. The manufacturing process of the thin-film ablation sensor is simple and has high measurement accuracy. Background technique [0002] The heat insulation layer is mainly used in the thermal protection of solid rocket motors, re-entry vehicles and other spacecraft. The performance of the heat insulation layer directly affects the reliability of the engine, and even affects the success or failure of the rocket launch. [0003] The working environment of the heat insulation layer is very harsh. It has to withstand the ablation of high temperatur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/04
Inventor 景涛谢贵久颜志红张建国
Owner 48TH RES INST OF CHINA ELECTRONICS TECH GROUP CORP
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