Manufacturing method of thin film capacitor
A technology for a film capacitor and a manufacturing method, which is applied in the directions of film/thick film capacitors, multilayer capacitors, etc., can solve the problems of increasing leakage current, inability to increase the capacity of film capacitors, and increasing annealing temperature.
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[0010] The present invention will be described in detail below through specific embodiments.
[0011] see figure 1 , the manufacturing method of the film capacitor that the present invention proposes comprises the following steps successively:
[0012] (1) Prepare raw materials with the following ratio: greater than or equal to 99.98% by weight of nickel ingot, 0.001-0.002% by weight of copper, 0.0005-0.0008% by weight of manganese, 0.005-0.008% by weight of aluminum, 0.0005-0.001% by weight of Chromium, 0.004-0.006% by weight iron, 0.0005-0.0012% by weight silicon and 0.001-0.002% by weight antimony and 0.001-0.002% by weight tantalum;
[0013] (2) After the above raw materials are melted, they are rolled into a foil, and then the foil is annealed to form a nickel substrate 1; the thickness of the nickel substrate 1 is 100-300 microns, preferably 200 microns.
[0014] (3) According to the tetragonal lead zirconate titanate PbZr 1-x Ti x o 3 Configure the molar ratio of l...
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