UV-curing micro-nano-structure template-splicing device and template-splicing process

Abstract

The invention relates to a UV-curing micro-nano-structure template-splicing device and a template-splicing process. The process comprises a base plate platform, a stamping machine body, a driving device, and a controlling system. The stamping machine body comprises a pressing roller, a light source, and a spraying nozzle. A transparent soft press mold is rolled on the pressing roller. The template-splicing device provided by the invention adopts a UV-curing working manner. No heating is needed, and the device works under normal temperature. During stamping, the roller and the base contact in a linear manner, such that air between the templates and the template splicing material can be effectively removed, and de-molding difficulty can be reduced. A soft press film technology is adopted, such that the cost is low, the efficiency is high, and the damage to an original template is low.

Description

technical field [0001] The invention relates to a micro-nano structure processing device, in particular to a micro-nano structure imposition device based on ultraviolet light curing, which is used in the technical field of micro-nano photoelectric device processing. Background technique [0002] With the continuous progress of micro-nano processing technology, the preparation process of micro-nano structure template is becoming more and more mature. At present, various micro-nano structures can be prepared on silicon, quartz and other materials by combined electron beam / ion beam lithography and etching. However, the preparation of large-scale micro-nano structures is technically difficult and the processing costs are still high. The main function of the micro-nano structure imposition equipment is to form the small-format micro-nano structure original plate through compression molding to form a large-format template. According to different working methods, imposition equip...

AI Technical Summary

Problems solved by technology

Its main disadvantages are: 1) Applying a lot of pressure is easy to cause damage to the template

2) High working temperature and long working cycle

3) Low structural fidelity due to springback of hot-pressed materials

[0005] Molecular Imprint Inc.'s equipment is actually a step-by-step UV nanoimprinter, and its limitations are: 1) It is mainly used for the production of silicon-based devices below the 12-inch format; 2) The imprint uses a plane-to-plane Way

This equipment has two disadvantages: one is that due to the large contact area between the stencil and the substrate, the surface micro-nano structure of the stencil increases the contact area between the two several times, and the difficulty of demolding increases; the other is that in this working method Can create air bubbles in the imprint, ruining the imposition effect

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