Light resistance composition as well as preparation method and display device thereof

Abstract

The invention relates to the technical field of display and in particular relates to a light resistance composition as well as a preparation method and a display device thereof. The light resistance composition comprises the following components: 80-120 parts of alkali soluble resin, 20-500 parts of compound containing a vinyl unsaturated bond, 0.01-100 parts of photoinitiator, 20-500 parts of pigment and 800-1200 parts of organic solvent, wherein the compound containing the vinyl unsaturated bond can participate in a cationic polymerization reaction. The light resistance composition can not be influenced by oxygen inhibition when carrying out ultraviolet irradiation and a polymerization reaction, so that oxygen blocking equipment is not required, and reduction of production cost of a product can be facilitated.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a photoresist composition, a preparation method thereof and a display device. Background technique [0002] With the rapid popularization of color liquid crystal display devices, people's requirements for the color display of the display devices are constantly increasing. A general color liquid crystal display device includes a color filter substrate and an array substrate in a box. A gap of 1 to 10 μm is set between the color filter substrate and the array substrate. The gap is filled with liquid crystal material, and the periphery is sealed with a sealant such as epoxy resin. . [0003] Wherein, the preparation of the color filter substrate is as follows: sequentially forming a black matrix, a color filter layer and a protective film on a transparent glass substrate. The black matrix is ​​used to prevent light leakage; the color filter layer includes three primary colors of ...

AI Technical Summary

Problems solved by technology

[0004] The photoresist composition in the traditional color filter layer adopts an acrylate photocuring system. Since the acrylate polymerization is a free radical polymerization mechanism, oxygen can quench the free radicals, that is, the inhibition of polymerization by oxygen is obvious. Therefore, in the polymerization process It is often required to use a protective atmosphere of inert gas such as nitrogen, or to set up an oxygen barrier film, which will complicate the polymerization process and increase production costs.

Images