Nano particle precise order assembling method
A nanoparticle and precise technology, applied in the direction of nanotechnology, nanotechnology, nanostructure manufacturing, etc., can solve the problems of inability to accurately control the effective assembly of nanoparticles, application limitations, etc., and achieve the convenience of large-scale production, low preparation cost, and strong control effect
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Embodiment 1
[0029] Select a silicon wafer, and use a conventional mask optical etching method to etch a regularly arranged 6×6 spindle columnar array on the surface of the silicon wafer (such as figure 1 shown), where the horizontal spacing between spindle columns in the spindle columnar array is 10 μm, the vertical spacing is 20 μm, and the height is 20 μm. The silicon wafer with the flat surface is cleaned with ethanol ultrasonically for 10 minutes and then blown dry with nitrogen; Figure 4 shown), the mass content of silver nanoparticles prepared by sodium lauryl sulfate and water is 0.5%, the mass content of sodium lauryl sulfate is 0.05%, and the balance is water suspension containing silver nanoparticles , use a dropper to drip onto the surface of the above-mentioned cleaned silicon wafer; then place the silicon wafer with a regularly arranged spindle columnar array structure on the surface on the surface of the silicon wafer containing a suspension of silver nanoparticles, so that...
Embodiment 2
[0031]Select a glass sheet, and use a conventional mask optical etching method to etch a regularly arranged 8×6 cylindrical array on the surface of the glass sheet, where the horizontal spacing between the columns in the cylindrical array is 10 μm, and the vertical The pitch is 20 μm and the height is 100 μm. A glass sheet with a flat surface was ultrasonically cleaned with ethanol for 10 minutes and then blown dry with nitrogen; 20%, the mass content of sodium dodecylbenzenesulfonate is 0.5%, and the balance is the suspension containing gold nanoparticles of ethanol, which is dripped onto the surface of the above-mentioned cleaned glass sheet with a dropper; then the above-mentioned surface has a regular The glass flakes arranged in a cylindrical array structure are placed on the surface of the glass flakes containing the suspension of gold nanoparticles, so that the glass flakes with a regularly arranged cylindrical array structure on the surface and the glass flakes of the ...
Embodiment 3
[0033] Select a quartz plate and use the conventional mask optical etching method to etch a regular array of 10×6 cube columns on the surface of the quartz plate, where the horizontal spacing between the cube columns in the cube columnar array is 10 μm, and the vertical The vertical pitch is 20 μm and the height is 500 μm. A quartz plate with a flat surface was ultrasonically cleaned with ethanol for 10 minutes and then dried with nitrogen; The mass content of stearic acid is 0.01%, the balance is the suspension containing platinum nano-particles of ethylene glycol, drops onto the surface of the above-mentioned cleaned quartz plate with a dropper; then the above-mentioned surface has a regularly arranged cube columnar array structure The quartz sheet is placed on the surface of the quartz sheet containing the suspension of platinum nanoparticles, so that the quartz sheet with a regularly arranged cube columnar array structure is closely attached to the quartz sheet containing ...
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