Method for improving field emission performance of material
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- DONGHUA UNIV
- Publication Date
- 2013-08-28
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for improving the performance of field electron emission, which can effectively improve the field emission performance of materials, realize the processing of regular micro-nano structures on the surface of materials, and further realize ultra-high resolution display. Background technique
[0002] Cold cathode field electron emission is to reduce the barrier height and narrow the width by applying an external voltage, resulting in the emission of electrons without energy loss. If the field emission is applied to the display, the cold electron emission technology is of great benefit to the improvement of the life of the display. Laser micro-nano processing is an effective and high-precision processing technology, which can provide technology and means for the research and preparation of functionalized optical microstructures, which makes laser processing in optical waveguides, photonic crystals, diffraction gratings, th...