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Block copolymers and methods related thereto

A technology of block copolymers and diblock copolymers, which can be applied to other household appliances, devices for coating liquid on surfaces, coatings, etc., and can solve the problems of block copolymer orientation control and long-range ordering difficulties.

Active Publication Date: 2016-03-30
ROHM & HAAS ELECTRONICS MATERIALS LLC +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These limitations create important challenges in the production of features with a critical dimension (CD) of <50nm
The use of conventional block copolymers presents difficulties in orientation control and long-range order during self-assembly

Method used

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  • Block copolymers and methods related thereto
  • Block copolymers and methods related thereto
  • Block copolymers and methods related thereto

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] Example 1: Preparation of hydroxyl-terminated polyethylene brushes

[0054] Cyclohexane (1500 g) was added in a 2 liter glass reactor under nitrogen atmosphere. Styrene (50.34 g) was then added to the reactor via cannula. The contents of the reactor were then heated to 40°C. A solution of sec-butyllithium (19.18 g) diluted at 0.32M in cyclohexane was then rapidly added to the reactor via cannula, causing the contents of the reactor to turn yellow. The contents of the reactor were stirred for 30 minutes. The contents of the reactor were then cooled to 30°C. Ethylene oxide (0.73 g) was then passed into the reactor. The contents of the reactor were stirred for 15 minutes. Then 20 mL of a 1.4 M solution of HCl in methanol was added to the reactor. The polymer in the reactor was then isolated by precipitation in isopropanol at a ratio of 500 mL polymer solution / 1250 mL isopropanol. The resulting precipitate was then filtered and dried overnight in a vacuum oven at 6...

Embodiment 2

[0057] Embodiment 2: prepare PMMA-b-PTMSMMA diblock copolymer

[0058] Tetrahydrofuran ("THF") (113 g) was added in a 500 mL 3-neck round bottom reactor under an argon atmosphere. THF was then cooled to -78°C in the reactor. A 0.36M solution of sec-butyllithium in cyclohexane was then titrated into the reactor contents until the reactor contents exhibited a solid pale yellow color. The contents of the reactor were then warmed and held at 30° C. until the color of the contents had completely disappeared (approximately 10-15 minutes). 1,1-Diphenylethylene (0.116 g) diluted in cyclohexane (2.278 g) was then transferred to the reactor via cannula. The contents of the reactor were then cooled to -78°C. Sec-butyllithium (6.15 g) diluted at 0.065 M in cyclohexane (6.15 g) was then rapidly added to the reactor via cannula, causing the contents of the reactor to turn a deep ruby ​​red. The contents of the reactor were stirred for 10 minutes. Methyl methacrylate (11.53 g) in cycl...

Embodiment 3

[0059] Embodiment 3: prepare PMMA-b-PTMSMMA diblock copolymer

[0060]Tetrahydrofuran ("THF") (142 g) was added under an argon atmosphere in a 500 mL 3-neck round bottom reactor. THF was then cooled to -78°C in the reactor. A 0.36M solution of sec-butyllithium in cyclohexane was then titrated into the reactor contents until the reactor contents exhibited a solid pale yellow color. The contents of the reactor were then warmed and held at 30° C. until the color of the contents had completely disappeared (approximately 10-15 minutes). 1,1-Diphenylethylene (0.086 g) diluted in cyclohexane (1.63 g) was then transferred to the reactor via cannula. The contents of the reactor were then cooled to -78°C. Sec-butyl lithium (4.5 g) diluted at 0.065 M in cyclohexane (4.5 g) was then rapidly added to the reactor via cannula, causing the contents of the reactor to turn a deep ruby ​​red. The contents of the reactor were stirred for 21 minutes. Methyl methacrylate (11.5 g) in cyclohex...

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Abstract

Block copolymers and methods related thereto. Provided is a copolymer composition comprising: a block copolymer having a (methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block ; wherein the block copolymer exhibits a number average molecular weight, MN, of 1-1000 kg / mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1-2.

Description

technical field [0001] The present invention relates to the field of self-assembled block copolymers. In particular, the present invention is directed to specific copolymer compositions comprising block copolymers having (methyl methacrylate) blocks and poly((trimethylsilyl)methyl methacrylate) blocks. Background technique [0002] Certain block copolymers, which consist of two or more different homopolymers linked at the ends, are known to self-assemble into periodic microdomains with characteristic dimensions ranging from 10 nanometers to 50 nanometers (nm). The possibility of using such micro-domains to pattern surfaces is of increasing interest due to the cost and difficulty of patterning at nanoscale dimensions (especially below 45 nm) using photolithography. [0003] However, controlling the lateral distribution of block copolymer domains on substrates remains a challenge. This problem has previously been addressed using lithographically predefined topographic maps a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08L53/00C08J5/18
CPCC08F297/026B29K2995/0026B29L2031/30C09D133/12C08L33/12C08L43/04C08F220/10C08F230/08C08L53/00C08J5/18B05D3/02
Inventor E·沃格尔V·靳兹伯格张诗玮D·默里P·赫斯塔德P·特雷福纳斯
Owner ROHM & HAAS ELECTRONICS MATERIALS LLC