Fourth generation alcohol-free additive not additionally added in suede preparation of monocrystalline silicon
A technology of monocrystalline silicon and additives, which is applied in the directions of crystal growth, post-processing details, and post-processing, etc., can solve the problems of shortening the texturing time, polluting the environment, and high cost, so as to reduce environmental pollution, reduce production costs, and improve photoelectric conversion rate effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0007] The fourth-generation additive that is not supplemented and alcohol-free for the monocrystalline silicon texturing process is characterized in that it includes the following main components: dispersant, humectant, deionized water; the dispersant is styrenesulfonic acid One or more of sodium, benzyl naphthalene sulfonate formaldehyde condensate, sodium polyaluminate, sodium hexametaphosphate, sodium methylene dinaphthalene sulfonate, sodium polysilicate, sodium lignosulfonate, sodium polyacrylate A combination; the moisturizing agent is sodium hyaluronate, D 5 - One or a combination of panthenol, glycerin, propylene glycol, polyethylene glycol, polypropylene glycol, honey, collagen. The fourth-generation additive that is not added and has no alcohol in the texturing process of monocrystalline silicon is characterized in that: the components are in percentage by weight: dispersant 0.5-15%; moisturizing agent 0.1-10%; The composition is composed of deionized water. Durin...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com