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Developing solution component

A technology of composition and developer, which is applied in the processing of photosensitive materials, etc., can solve the problems of liquid crystal pollution, photoresist material resolution deterioration, afterimage, etc., and achieve the effect of preventing afterimage, good resolution and pattern refinement

Active Publication Date: 2013-09-11
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This will lead to the poor resolution of the prepared photoresist material in the alkaline developer composition and it is difficult to form the designed pattern shape
In addition, due to the presence of metal ions such as Na+ and K+ in the inorganic alkali developer composition, they will remain in the photoresist layer, which may cause liquid crystal contamination, resulting in afterimages and other defects.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Take 0.3 parts by mass of hydrochloric acid, 0.5 parts by mass of sodium lauryl sulfate, 5 parts by mass of ethanol, and 0.01 parts by mass of an antifoaming agent, add them to 94.19 parts by mass of deionized water, and stir evenly to make a developer composition 1.

Embodiment 2

[0030] Get 0.3 parts by mass of hydrochloric acid, 1.0 parts by mass of dodecyldimethylbenzyl ammonium chloride, 6 parts by mass of N-methylpyrrolidone, and 0.01 parts by mass of defoamer, and add them to 92.69 parts by mass of deionized water, stirred evenly to make developer solution composition 2.

Embodiment 3

[0032] Get 0.3 parts by mass of dilute sulfuric acid, 0.5 parts by mass of sodium dodecylbenzenesulfonate, 0.5 parts by mass of span20, 4 parts by mass of N, N-dimethylformamide, 0.01 parts by mass of defoamer, add into 94.69 parts by mass of deionized water, and stirred evenly to make developer solution composition 3.

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Abstract

The invention relates to a developing solution component. The developing solution component disclosed by the invention comprises the following components in parts by weight: 0.01-5.0 parts of inorganic acid or organic acid, 0.01-5.0 parts of a surfactant, 0.1-10.0 parts of an organic solvent dissolved in water, 85-99 parts of the water and 0-2 parts of an additive, wherein the total weight of the developing solution component is 100 parts. According to the developing solution component disclosed by the invention, the problem that an alkaline hyperdispersant is added in the particle micronization preparation of light resistance paint and is difficult to develop in an alkaline developing solution component can be solved, so that the requirements of good resolution and pattern refinement can be met.

Description

technical field [0001] The invention relates to the technical field of photoetching and development, in particular to a developer solution composition for developing color filters. Background technique [0002] Color filter (Color filter) is an optical filter that expresses color, it can precisely select the small range of light waves to pass, and reflect off other unwanted wave bands. Color filters are usually installed in front of the light source so that the human eye can receive saturated light of a certain color. At present, the color filters include infrared filters, green filters, blue filters, etc. [0003] The developer composition used in the color filter is basically an alkaline developer composition, including carbonate, potassium hydroxide-based inorganic alkali developer composition and tetramethylammonium hydroxide-based organic alkali developer composition. The alkaline developer composition is widely used because of its good developing performance on photo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
CPCG03F7/32
Inventor 杨同华吴洪江黎敏张继凯
Owner BOE TECH GRP CO LTD
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