A kind of manufacturing method of lithium niobate optical waveguide device electrode

Abstract

Disclosed in the invention is a manufacturing method for an electrode of a lithium niobate optical waveguide device. The manufacturing method comprises the following steps: using SiO2 as a mask and manufacturing an optical waveguide by using annealing proton exchange processing; utilizing the SiO2 mask as a mark to directly carry out self-alignment overlaying on the optical waveguide and an electrode graph; removing the SiO2 mask of the electrode zone by employing a method of combination of dry etching with wet etching; and utilizing sputtering and metal stripping technologies to manufacture the electrode graph and removing the residual SiO2 mask. When the method is used, the electrode graph can be formed at the lithium niobate optical waveguide and accurate overlaying between the optical waveguide and the electrode is ensured; the edge of the electrode is smooth; the defects are less; and the yield is high.

Description

technical field [0001] The invention relates to a manufacturing method of an optical passive device, in particular to a manufacturing method of an electrode of a lithium niobate optical waveguide device, and the invention belongs to the field of communication. Background technique [0002] Since the first observation of the optical waveguide phenomenon in the 1960s, the theory of optical waveguides has developed rapidly, and various photonic devices have come out one after another, and have been tried to be applied to many fields. Not only single-function integrated devices such as semiconductor lasers, detectors, optical modulators, optical switches, optical amplifiers, and optical sensors have been produced, but also multiple core devices can be integrated to form a device system with certain complex functions. [0003] Due to its excellent electro-optic, acousto-optic, photoelastic, nonlinear, photorefractive and other properties, lithium niobate crystal is widely used in...

AI Technical Summary

Problems solved by technology

[0005] Since the patterned electrode and optical waveguide must be overlaid accurately, and the SiO2 masks on both sides of the surface of the lithium niobate optical waveguide have been removed before the electrode pattern is overlaid in the existing technology, it is necessary to specially make an overlay mark on the surface of the substrate. , instead of directly overlaying the electrode pattern and the optical waveguide, it is difficult to guarantee the accuracy and repeatability of the overlay

In addition, due to the use of wet etching method to make electrodes, the plated metal film is required to be easy to corrode, and there are restrictions on the types of metal electrodes. Metals such as Pt are difficult to use wet etching.

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