Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Graphene-based reflective type saturable absorber and preparation method

A saturable absorption and graphene technology, which is applied in laser components, optics, instruments, etc., can solve the problems of graphene film easy to fall off, enhance light scattering, easy damage, etc., and achieve mass production and high optical damage threshold , the effect of stable performance

Inactive Publication Date: 2013-10-23
SHANGHAI JIAO TONG UNIV
View PDF2 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] But these three also have their own disadvantages: the type attached to the end face of the optical fiber, the graphene film is often difficult to remove PMMA (polymethyl methacrylate), the existence of PMMA limits the intensity of the optical field, because the high optical field intensity is easy PMMA graphene film is attached to the damage. In addition, this structure also has significant disadvantages such as easy damage, graphene film is easy to fall off, and cannot be mass-produced.
It is also difficult to remove PMMA attached to the side-cut optical fiber, which will affect the saturable absorption of its graphene
The graphene attached to the taper region of the tapered fiber is chaotically attached to the taper region, and the uniformity is poor, which will enhance the scattering of light, and when the power is large, it is easy to cause energy to gather at a certain point and burn out the fiber

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Graphene-based reflective type saturable absorber and preparation method
  • Graphene-based reflective type saturable absorber and preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Combine below figure 2 The graphene-based reflective saturable absorber and its preparation method are introduced in detail. figure 2 Including: copper foil 1, graphene 2, first gold film 3, silicon substrate 4, second gold film 5, optical fiber 6, contact surface 7 between optical fiber and graphene.

[0041] A method for preparing a reflective saturable absorber based on graphene, comprising the following steps:

[0042]Graphene 2 is grown on copper foil 1 by a chemical vapor deposition (CVD) method. First put the copper foil 1 into the quartz tube, raise the temperature to 800-1100°C, then pass in 10-200 sccm of hydrogen for 5-30 minutes, and then pass in one or two gases of methane and acetylene, the gas flow rate is 10 ~300 sccm, after graphene 2 grows for 5~60 minutes, turn off the carbon source gas and cool down rapidly under the hydrogen atmosphere. A first gold film 3 with a thickness of about 200 nm is deposited on the upper surface of the grown graphene ...

Embodiment 2

[0047] Graphene was grown on copper foil by chemical vapor deposition (CVD). First put the copper foil into the quartz tube, the temperature rises to 800-1100°C, then pass in 10-200sccm of hydrogen for 5-30 minutes, and then pass in one or two gases of methane and acetylene, the gas flow rate is 10-200sccm 300 sccm, after 5-60 minutes of graphene growth, turn off the carbon source gas and rapidly cool down in the hydrogen atmosphere. A first silver film with a thickness of about 200 nm is plated on the upper surface of the grown graphene. A second silver film with a thickness similar to that of the first silver film is plated on a silicon dioxide substrate with a thickness of millimeter order. Place the copper foil upwards and place the first silver film downwards. The first silver film and the second silver film are glued together by means of ultraviolet glue, so that the first silver film and the second silver film are integrated, which is the so-called reflection film lay...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a graphene-based brand-new reflective type saturable absorber and a preparation method. The obtained saturable absorber comprises a saturable absorption layer, a reflective film layer and a substrate layer. The preparation method comprises the steps as follows: plating a gold film on a graphene thin film growing on a copper foil, reversing the gold film to face downward, binding with a silicon substrate the upper surface of which is plated with the gold film, contacting a smooth optical fiber end surface and graphene smoothly, and fixing and packaging the optical fiber and the absorber together. As the saturable absorber, the graphene has the advantages of being low in saturation strength, ultrafast in recovery time, adjustable in modulation depth, unrelated with wavelength, low in cost and the like, and by combining the specific structure advantage of the reflective type saturable absorber, the novel saturable absorber which is practical, simple and high-efficiency, stable in working property, high in optical damage and convenient for large-scale production can be realized.

Description

technical field [0001] The invention relates to a laser optical device, in particular to a reflective saturable absorber and a preparation method. Background technique [0002] Ultrashort pulses have important applications in the fields of optical fiber communication, ultrafast optics, optical fiber sensing, industrial processing, optical information processing, laser guidance, medical treatment, inertial-constrained fast ignition, etc., and have attracted extensive research in recent years. Saturable absorbers are one of the common methods for passively mode-locked lasers to achieve ultrashort pulses. The basic mechanism of saturable absorber to achieve mode locking: when the light pulse passes through this absorber, the loss of the wing part is greater than the loss of the central part, and its intensity is enough to saturate the absorber. As a result, the light pulse passes through the absorber. is narrowed in. [0003] The current saturable absorbers mainly include: dy...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/11G02F1/35B82Y20/00
Inventor 郑燃义理林李伟雄胡卫生
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products