Microglow discharge ionization source integrated faims
A technology of glow discharge and ionization source, applied in ion source/gun, parts of particle separator tube, material analysis by electromagnetic means, etc., can solve the problems of electric field interference, affecting the stability and sensitivity of the device, etc.
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Embodiment 1
[0029] The structure of microglow discharge ionization source integrated FAIMS described in the present invention is as follows: figure 1As shown, it includes a PCB board 9 and a supporting and fixing board 3, one end of the supporting and fixing board 3 is connected to the PCB board 9, and the other end is an open end, and an air inlet and a power interface are arranged on the open end ; The inside of the fixed support plate is provided with a microglow discharge ionization source 6, a FAIMS chip 7 and a detector 8 sequentially from the open end to the connection end, and the detector 8 is arranged on the PCB board 9, and the The air inlet, the micro-glow discharge ionization source 6 , the FAIMS chip 7 and the detector 8 form a passage through the support and fixing plate 3 and the PCB board 9 . The sample enters the sample channel from the air inlet port, and the sample is ionized by the micro-glow discharge ion source. When the distance between the two electrodes is 50 mic...
Embodiment 2
[0031] The micro-glow discharge ionization source 6 in the micro-glow discharge ionization source integrated FAIMS of the present invention is as follows: figure 2 As shown, the microglow ionization source includes positive discharge electrodes 2 and negative discharge electrodes 1, and positive electrode flow guide plates 5 and negative electrode flow guide plates 4 are alternately arranged oppositely between the positive discharge electrodes 2 and negative discharge electrodes 1, Only one end of the positive deflector 5 is connected to the positive discharge electrode 2; only one end of the negative deflector 4 is connected to the negative discharge electrode 1; the positive deflector 5 and the negative deflector 4 to form a continuous channel, the number of the positive discharge electrodes 2 and the negative discharge electrodes 1 can be adjusted according to actual needs, and it is preferably a silicon chip, the thickness of the silicon chip is 0.1-5mm. The most preferre...
Embodiment 3
[0034] A plurality of ion migration channels are etched in the middle of the FAIMS chip 7 in the microglow discharge ionization source integrated FAIMS of the present invention along the longitudinal direction on the silicon wafer. The pitch of each channel is preferably 20-500 microns, and the depth of the channels is preferably 200-3000 microns. An asymmetric radio frequency high voltage is preferably added to the two electrodes of the FAIMS chip 7, and the frequency is preferably 0.2-30 MHz to realize an environment in which high and low electric fields alternately change.
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