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Gas barrier laminate film, and method for producing same

A manufacturing method and laminated film technology, applied in chemical instruments and methods, coatings, layered products, etc., can solve the problems of reduced productivity and insufficient gas barrier properties of plastic films, and achieve high productivity and gas barrier properties. sex high effect

Inactive Publication Date: 2013-12-25
MITSUBISHI PLASTICS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, even with this film forming method, the gas barrier properties of the obtained plastic film are not sufficient, and there is a problem that the productivity will be significantly lowered in order to improve the gas barrier properties.

Method used

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  • Gas barrier laminate film, and method for producing same
  • Gas barrier laminate film, and method for producing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0092] As the base material film, a polyethylene naphthalate film ("Q51C" manufactured by Teijin DuPont) with a thickness of 12 μm was used, and an isocyanate compound ("CORONATE L" manufactured by Nippon Polyurethane Industry Co., Ltd.) was coated on the corona-treated surface. ) and saturated polyester ("PYLON300" manufactured by Toyobo, with a number average molecular weight of 23,000) at a mass ratio of 1:1 and dried to form an adhesion-promoting coating with a thickness of 0.1 μm. sticky coating on a 2 x 10 -3 Evaporate SiO under a vacuum of Pa to form SiO with a thickness of 32nm x Vacuum evaporation film (PVD film).

[0093] Next, by the FTS method, under the conditions of a film forming pressure of 0.5Pa and a power of 4000W, SiO with a thickness of 50nm was formed on the PVD film. x N y film, a laminated film was obtained. The above-mentioned evaluation was performed on the obtained laminated film. The results are shown in Table 1.

[0094] The obtained SiO was ...

Embodiment 2

[0096] In Example 1, in SiO x N y film on a 2 x 10 -3 Evaporate SiO in a vacuum of Pa to form SiO with a thickness of 50 nm as the uppermost layer x Except for the PVD film, it carried out similarly to Example 1, and obtained the laminated film. The above-mentioned evaluation was performed on the obtained laminated film. The results are shown in Table 1.

Embodiment 3

[0098] In Example 2, the SiO x N y Except having set the thickness of the PVD film on a film to 100 nm, it carried out similarly to Example 2, and obtained the laminated film. The above-mentioned evaluation was performed on the obtained laminated film. The results are shown in Table 1.

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Abstract

The present invention provides a gas barrier laminate film containing a substrate film having on at least one surface thereof plural layers of an inorganic thin film layer, from a first layer to an n-th layer (wherein n represents an integer of 1 or more) of the inorganic thin film layer on a side of the substrate film being formed by a non-plasma film forming method, and an (n+1)-th layer formed thereon in contact therewith being formed by a facing target sputtering method, and a method for producing a gas barrier laminate film containing a substrate film having on at least one surface thereof one or plural layers of an inorganic thin film layer, the method containing: forming from a first layer to an n-th layer of the inorganic thin film layer on a side of the substrate film by a non-plasma film forming method; and forming an (n+1)-th layer thereon in contact therewith by a facing target sputtering method, and thus provides a gas barrier laminate film with high gas barrier property and excellent productivity having a dense inorganic thin film layer that inflicts less damage to a substrate film, particularly to a resin film, on which the inorganic thin film layer is formed, and a method for producing the same.

Description

technical field [0001] The present invention relates to packaging, liquid crystal display elements, inorganic solar cells, electromagnetic shielding, touch panels, color filters, vacuum insulation materials, organic EL (electroluminescence), A gas barrier multilayer film used in organic devices such as organic solar cells and organic TFTs, and a method for producing the same. Background technique [0002] Gas-barrier plastic films with plastic film as the base material and an inorganic film formed on the surface are widely used in the packaging of items that need to be isolated from various gases such as water vapor or oxygen, for example, to prevent food, industrial supplies and Deteriorated packaging of pharmaceuticals, etc. In addition, the gas-barrier plastic film has been widely used in liquid crystal display elements, inorganic solar cells, electromagnetic shielding, touch panels, color filters, vacuum insulation materials, organic EL, organic solar cells, organic TFT...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/00C23C14/34
CPCC23C14/0676C23C14/352Y10T428/265Y10T428/31504Y10T428/31678B32B9/00B32B27/06C23C14/34B32B33/00
Inventor 天内英隆宫崎亮
Owner MITSUBISHI PLASTICS INC