Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

ZnS nano-crystalline film and preparation method and application thereof

A nanocrystal and thin film technology, applied in the fields of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of restricted use, human and environmental hazards, and difficulty in ZnS film formation and preparation efficiency. The effect of improving short-circuit current, cheap price and good application prospect

Active Publication Date: 2015-04-22
SUN YAT SEN UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the buffer layer of CIGS and CZTS, the original production technology has always been to use CdS thin film, but the Cd element in CdS is highly toxic, which is harmful to human body and environment during production and use, and its use should be restricted
Therefore, it was later discovered that ZnS can replace CdS as a cadmium-free buffer layer, but the properties and characteristics of ZnS determine that when ZnS thin films are prepared by chemical methods, ZnS has the characteristics of difficult film formation and low preparation efficiency.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • ZnS nano-crystalline film and preparation method and application thereof
  • ZnS nano-crystalline film and preparation method and application thereof
  • ZnS nano-crystalline film and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] ZnS nanocrystalline film is prepared according to the following steps:

[0032] (1) Preparation of the substrate: first clean the substrate, ultrasonically clean it for 15 minutes in the order of acetone, absolute ethanol, and deionized water, and then dry it for storage.

[0033] (2) Prepare 200ml of basic solution, the concentration of ZnSO4 in the prepared basic solution is 0.05mol / L, and the concentration of (NH4)2SO4 is 0.01mol / L.

[0034] (3) Put the basic solution in a water bath environment and heat it in a water bath. When it is heated to 80°C, add ammonia solution and SC(NH2)2 solution to it at the same time to obtain a mixed solution, and make ammonia water and SC(NH2)2 in the mixed solution The concentrations in are 1.5mol / L and 0.3mol / L respectively;

[0035] (4) Put the substrate in step 1 vertically into the mixed solution, then slowly add triethanolamine dropwise, and the concentration of the added triethanolamine in the mixed solution is controlled to ...

Embodiment 2

[0039] ZnS nanocrystalline film is prepared according to the following steps:

[0040] (1) Preparation of the substrate: first clean the substrate, ultrasonically clean it for 15 minutes in the order of acetone, absolute ethanol, and deionized water, and then dry it for storage.

[0041] (2) Prepare 200ml of basic solution, the concentration of ZnSO4 in the prepared basic solution is 0.2mol / L, and the concentration of (NH4)2SO4 is 0.1mol / L.

[0042] (3) Put the basic solution in a water bath environment and heat it in a water bath. When it is heated to 80°C, add ammonia solution and SC(NH2)2 solution to it at the same time to obtain a mixed solution, and make ammonia water and SC(NH2)2 in the mixed solution The concentrations in are 3.0mol / L and 0.5mol / L respectively;

[0043](4) Put the substrate in step 1 vertically into the mixed solution, then slowly add triethanolamine dropwise, and the concentration of the added triethanolamine in the mixed solution is controlled to be ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for preparing a ZnS nano-crystalline film through chemical bath deposition, a prepared ZnS film and an application. The method comprises the following steps: (1) preparing a basic solution, water bath heating the basic solution, and meanwhile, constantly stirring the basic solution, wherein the ZnSO4 concentration in the basic solution is 0.01-0.2 mol / L, and the (NH4)2SO4 concentration is 0.01-0.1 mol / L; (2) when the temperature of the basic solution raises to 60-90 DEG C, adding ammonia water and thiourea, wherein the concentrations of the ammonia water and thiourea in the obtained mixed solution are respectively 0.5-3.0 mol / L and 0.1-0.5 mol / L; (3) vertically putting a substrate in the mixed solution, and dripping triethanolamine into the mixed solution; and (4) taking out the substrate after the deposition thickness of the ZnS film on the substrate reaches a preset value, and cleaning and storing the substrate. The ZnS nano-crystalline film prepared by the method provided by the invention is uniform and dense.

Description

technical field [0001] The invention belongs to the technical field of preparation of ZnS nanocrystalline semiconductor thin films, and in particular relates to the preparation of ZnS nanocrystalline semiconductor thin films by chemical methods. Background technique [0002] In view of the current global warming, the continuous deterioration of the human ecological environment and the shortage of conventional fossil energy, solar photovoltaic power generation technology has been supported and valued by governments of various countries. The current increasingly serious energy crisis forces people to develop low-cost, high-efficiency non-silicon thin-film solar cells. Non-silicon thin-film solar cells have attracted the interest of manufacturers due to their low production cost, high conversion efficiency, strong radiation resistance, and low light-induced attenuation. The output of non-silicon thin-film solar cells has grown rapidly. Materials used to prepare non-silicon thi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0296C01G9/08C03C17/22C04B41/50H01L31/18B82Y40/00B82Y30/00
CPCY02P70/50
Inventor 洪瑞江周新
Owner SUN YAT SEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products