A kind of preparation method of porous silicon material, prepared porous silicon material and application thereof
A technology of porous silicon and raw materials, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of high equipment requirements, difficult mass production, complex preparation process, etc., to avoid precious metal catalysts, solve high production costs, The effect of green cleaning preparation
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Embodiment 1
[0048] The homemade 0.1g Mn 0.5 co 0.5 Fe 2 o 4 Powder catalyst and 1.0g sodium acetate are dispersed in ethylene glycol solution, and then mixed with about 1cm 2 The silicon wafers were put into a Teflon-lined reactor together, and reacted for 48 hours at 200°C, then cooled to room temperature, and the Mn after the reaction 0.5 co 0.5 Fe 2 o 4 The powder can be recycled after being separated from ethylene glycol. After the reaction will contain Mn 0.5 co 0.5 Fe 2 o 4 The powdered silicon chip is washed 5 times with deionized water, ultrasonically treated in hydrochloric acid at 90°C for 2 hours to remove the catalyst on the surface of the silicon chip, washed 5 times with deionized water, and then stirred and reacted in sodium hydroxide solution After 24 hours, the silicon dioxide on the surface of the porous silicon was removed, washed repeatedly with deionized water for 5 times, and dried in a vacuum oven at 80° C. for 24 hours to obtain the final porous silicon ...
Embodiment 2
[0053] The homemade 0.1g Mn 0.5 co 0.5 Fe 2 o 4 Powder catalyst and 1.0g sodium acetate are dispersed in ethylene glycol solution, and then with about 2cm 2 Put silicon powder together into a polytetrafluoroethylene-lined reactor, and react for 48 hours at 200°C, then cool to room temperature, and the Mn after reaction 0.5 co 0.5 Fe 2 o 4 The powder can be recycled after being separated from ethylene glycol. After the reaction will contain Mn 0.5 co 0.5 Fe 2 o 4 The powdered silicon powder is washed 5 times with deionized water, ultrasonically treated in hydrochloric acid at 90°C for 2 hours to remove the catalyst on the surface of the silicon wafer, washed 5 times with deionized water, and then stirred and reacted in sodium hydroxide solution After 24 hours, the silicon dioxide on the surface of the porous silicon was removed, washed repeatedly with deionized water for 5 times, and dried in a vacuum oven at 80° C. for 24 hours to obtain the final porous silicon she...
Embodiment 3
[0056] will be about 1cm 2 Silicon wafer with 0.4 g Fe purchased commercially 2 o 3 The powder catalyst and 3g of potassium acetate are dispersed in 60ml of ethylene glycol and 20ml of ethanol mixture solution, then put into a polytetrafluoroethylene-lined reactor, and react for 80 hours at 250°C, then cool to room temperature, and Fe 2 o 3 The powder can be recycled after being separated from ethylene glycol and ethanol. After the reaction will contain Fe 2 o 3The powdered silicon chip is washed 5 times with deionized water, ultrasonically treated in hydrochloric acid at 90°C for 2 hours to remove the catalyst on the surface of the silicon chip, washed 5 times with deionized water, and then stirred and reacted in sodium hydroxide solution After 24 hours, the silicon dioxide on the surface of the porous silicon was removed, washed repeatedly with deionized water for 5 times, and dried in a vacuum oven at 80° C. for 24 hours to obtain the final porous silicon sheet materia...
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Abstract
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