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A reflective objective lens structure and manufacturing method thereof

A mirror and mirror support technology, applied in the field of lithography, can solve the problems of unfavorable dynamic performance of the whole machine, large internal space of the lithography machine, unfavorable exposure accuracy, etc., achieve simple and efficient objective lens structure, and ensure high-precision lithography resolution rate, improve the effect of dynamic stability

Active Publication Date: 2015-09-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The advantage of the objective lens designed in this way is that it has a simple structure and is formed by compounding 8-9 plates; the disadvantage is that the volume is too large, it occupies a lot of space inside the lithography machine, and the modal value is relatively low, which is not conducive to the dynamic performance of the whole machine and is not conducive to The guarantee of its exposure accuracy

Method used

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  • A reflective objective lens structure and manufacturing method thereof
  • A reflective objective lens structure and manufacturing method thereof
  • A reflective objective lens structure and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0052] This implementation mode provides a kind of manufacturing method of polyhedron objective lens structure, and its flow process is as follows figure 2 As shown, it specifically includes the following steps:

[0053] Step S1: Data collection.

[0054] image 3 Shown is the required optical path of the polyhedral objective lens and the structure diagram when it is formed in the form of a mirror. First, the installation position of the polyhedral mirror in three-dimensional space and the layout of the optical path in space are determined according to the optical design. In addition, effectively identify and define the location of the installation area of ​​the mirror support device, lens device, measurement system, adjustment device and cooling system device inside the polyhedron objective lens, and clarify the location points of all relevant interfaces or the three-dimensional space data of the installation area. In this embodiment, the objective lens specifically includ...

no. 2 approach

[0063] This embodiment provides a method for manufacturing a polyhedral objective lens structure, the process of which is the same as that of the first embodiment, including:

[0064] Step S1: Data collection.

[0065] image 3 Shown is the required optical path of the polyhedral objective lens and the structure diagram when it is formed in the form of a mirror. First, the installation position of the polyhedral mirror in three-dimensional space and the layout of the optical path in space are determined according to the optical design. In addition, effectively identify and define the location of the installation area of ​​the mirror support device, lens device, measurement system, adjustment device and cooling system device inside the polyhedron objective lens, and clarify the location points of all relevant interfaces or the three-dimensional space data of the installation area. In this embodiment, the objective lens specifically includes all mirrors, all mirror support devi...

no. 3 approach

[0073] This embodiment provides a method for manufacturing a polyhedral objective lens structure, the process of which is the same as that of the first embodiment, including:

[0074] Step S1: Data collection.

[0075] image 3 Shown is the required optical path of the polyhedral objective lens and the structure diagram when it is formed in the form of a mirror. First, the installation position of the polyhedral mirror in three-dimensional space and the layout of the optical path in space are determined according to the optical design. In addition, effectively identify and define the location of the installation area of ​​the mirror support device, lens device, measurement system, adjustment device and cooling system device inside the polyhedron objective lens, and clarify the location points of all relevant interfaces or the three-dimensional space data of the installation area. In this embodiment, the objective lens specifically includes all mirrors, all mirror support devi...

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Abstract

The invention discloses a reflection type objective lens structure of an EUV exposure lithographic device and a manufacturing method thereof. The manufacturing method comprises the steps of data acquisition, establishment of an external structure of an objective lens, and model modification of the external structure of the objective lens. The reflection type objective lens structure is designed based on a polyhedron structure, is simple and efficient, and can achieve good dynamic property and stability. Meanwhile, the reflection type objective lens structure meets the processing characteristics that a main base plate is formed by monoblock casting or welding forming, and the objective lens formed by the reflection type objective lens structure has the performance advantages of high modality and low mass in comparison with objective lenses with conventional structures.

Description

technical field [0001] The invention relates to the field of lithography, in particular to EUV exposure lithography equipment. Background technique [0002] At present, extreme ultraviolet lithography (EUVL) has become the mainstream development trend of next-generation lithography technology, especially the design of reflective objective lens is a key technology. US 6977713 B2【1】, US 7116399 B2【2】, US 7126671 B2【3】, US 7161658 B2【4】, US 7450301 B2【5】, US 20070070322 B2【6】, US 20070283591 B2【7】 , US 20090079952 B2 [8] and US 20090147386 B2 [9] proposed an EUVL arc-shaped large field of view objective lens composed of six mirrors, wherein each mirror has an objective lens mount at the bottom or top, and the objective lens has The adjustment device can adjust the compensation within the range of 6 degrees of freedom, and measure the relative position of each lens with laser interferometer or capacitance sensor. In order to solve the requirements for the installation and adju...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B17/06G02B7/182
Inventor 吴飞王茜杨晓青武珩陈文枢王帆
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD