Copolymerization modified ordered mesoporous carbon nitride photocatalyst

A technology of porous carbon nitride light and porous carbon nitride is applied in the field of copolymerization modified ordered mesoporous carbon nitride photocatalyst and its preparation, which can solve the problem of reducing the visible spectrum response and utilization, and the forbidden band of carbon nitride semiconductor. The width becomes larger and other problems, to achieve the effect of expanding the light absorption range, accelerating the mass transfer and diffusion process, and the preparation method is simple and feasible

Inactive Publication Date: 2014-04-16
FUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the nanometer size is reduced, the quantum size effect will increase the forbidden band width of the carbon nitride semiconductor, reducing the response and utilization of the visible spectrum.

Method used

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  • Copolymerization modified ordered mesoporous carbon nitride photocatalyst
  • Copolymerization modified ordered mesoporous carbon nitride photocatalyst
  • Copolymerization modified ordered mesoporous carbon nitride photocatalyst

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Stir the mixture of soft template agent and hydrochloric acid solution (concentration: 1.6 mol / L) at a ratio of 1g:8mL at 45°C until the solution is clear and transparent, add silicon source (P123:TEOS=1g:1.9g), and continue stirring 18h, hydrothermal crystallization at 140°C for 24h, washing and drying, calcination at 450°C for 8h to remove organic matter, and obtain SBA-15 ordered mesoporous silica.

[0026] Add 10 times the amount of the silicon dioxide obtained above to a hydrochloric acid solution with a concentration of 2.0 mol / L, heat and stir at 80° C. for 24 hours, centrifuge, and dry to obtain an acidified silicon dioxide hard template.

[0027] Put the mixture of the precursor step and the above-mentioned acidified silica in a flask (the mass ratio of cyanamide, 3-aminothiophene-2-carbonitrile, and silica template is 10: 0.1: 1), at 50 Under the condition of heating at ℃, ultrasonically and vacuumize the mixture (vacuum degree <1kPa) for 6h, add 20mL of water...

Embodiment 2

[0029] Stir the mixture of 1g:5mL soft template agent and hydrochloric acid solution (concentration: 1.6 mol / L) at 35°C until the solution is clear and transparent, add silicon source (P123:TEOS=1g:1.1g), and continue stirring 12h, hydrothermal crystallization at 120°C for 24h, washing and drying, calcination at 450°C for 6h to remove organic matter, and obtain SBA-15 ordered mesoporous silica.

[0030] Add 25 times the amount of the silicon dioxide obtained above to a hydrochloric acid solution with a concentration of 1.0 mol / L, heat and stir at 80° C. for 16 hours, centrifuge, and dry to obtain an acidified silicon dioxide hard template.

[0031] Put the mixture of the precursor step and the above-mentioned acidified silica in a flask (the mass ratio of cyanamide, 3-aminothiophene-2-carbonitrile, and silica template is 4: 0.0013: 1), at 55 Under the condition of heating at ℃, ultrasonically and vacuumize the mixture (vacuum degree <1kPa) for 4h, add 15mL water to wash and ce...

Embodiment 3

[0033]Stir the mixture of soft template agent and hydrochloric acid solution (concentration: 1.6 mol / L) at a ratio of 1g: 11mL at 35°C until the solution is clear and transparent, add silicon source (P123: TEOS = 1g: 1.6g), and continue stirring 24h, at 150 o C for hydrothermal crystallization for 24 hours, washed and dried, and calcined at 550°C for 4 hours to remove organic matter to obtain SBA-15 ordered mesoporous silica.

[0034] Add 20 times the amount of the silicon dioxide obtained above to a hydrochloric acid solution with a concentration of 1.0 mol / L, heat and stir at 80° C. for 12 hours, centrifuge, and dry to obtain an acidified silicon dioxide hard template.

[0035] Place the mixture of the precursor step and the above-mentioned acidified silica in a flask (the mass ratio of cyanamide, 3-aminothiophene-2-carbonitrile, and silica template is 8: 0.005: 1), at 55 Under the condition of heating at ℃, ultrasonically and vacuumize the mixture (vacuum degree <1kPa) for...

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Abstract

The invention discloses a copolymerization modified ordered mesoporous carbon nitride photocatalyst and a preparation method and an application thereof, belonging to the technical field of material preparation and photocatalysis. The copolymerization modified ordered mesoporous carbon nitride photocatalyst is obtained by taking cyanamide and organic small molecular monomer (3-aminothiophene-2-formonitrile) as precursors, and SBA-15 type ordered mesoporous silica as a hard template, through high-temperature thermal polymerization under inert atmosphere, and etching with ammonium hydrogen fluoride to remove the hard template. The copolymerization modified ordered mesoporous carbon nitride photocatalyst prepared by the preparation method has a microstructure in the shape of a cylindrical rod and regular mesoporous channels in two-dimensional hexagonal P6mm orderly arrangement, and is wide in response range of visible light. The copolymerization modified ordered mesoporous carbon nitride photocatalyst and the preparation method and the application thereof disclosed by the invention are easy in synthesis process, and high in catalytic efficiency, and can be applied to the photocatalysis fields of photolysis aquatic hydrogen, organic selective oxidation and the like.

Description

technical field [0001] The invention belongs to the technical field of material preparation and photocatalysis, and in particular relates to a copolymerized modified ordered mesoporous carbon nitride photocatalyst and its preparation method and application. Background technique [0002] Since the Japanese scientists Fujishima and Honda first discovered that titanium dioxide has photocatalytic water splitting to produce hydrogen in the 1970s, the core of the field of photocatalytic technology is to explore cheap photocatalysts with high visible light utilization, high quantum efficiency and high stability (J . Phys. Chem. Lett. 2010, 1, 2655). Carbon Nitride (C 3 N 4 ), as a polymer with a long history, has excellent properties such as low density, wear resistance, high chemical stability, and good biocompatibility, and is widely used in high-performance wear-resistant coatings, membrane materials, gas sensors, battery electrodes, Catalysts and catalyst supports, preparati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J31/06B01J27/24C01B3/04
CPCY02E60/364Y02E60/36
Inventor 王心晨张明文张金水
Owner FUZHOU UNIV
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