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Radiation source

A radiation source, laser radiation technology, applied in the field of radiation sources

Active Publication Date: 2014-04-16
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Either or both of these issues may result in the need for larger tubes in terms of tube length and / or width
Space within the radiation source is at a premium and making the radiation source larger just to accommodate such a tube-based capture device is undesirable in terms of space constraints, design constraints, and cost

Method used

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Examples

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Embodiment Construction

[0044] figure 1 A lithographic apparatus LAP comprising a source collector module SO according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. EUV radiation); a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask or reticle) MA, and is connected to the first positioning device PM configured for precisely positioning the patterning device; the substrate table (eg, wafer table) WT, configured to hold a substrate (eg, coated with resist wafer) W connected to a second positioning device PW configured to precisely position the substrate; and a projection system (e.g. a reflective projection system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portion C of the substrate W (eg, comprising one or more dies).

[0045] The illumination syste...

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Abstract

A radiation source includes: a nozzle configured to direct a stream of fuel droplets (30) along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location, the catch including: a container (40) configured to contain a fluid (42); a driver (44) configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of US Provisional Application 61 / 522,928, filed August 12, 2011, and is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to a radiation source suitable for use with or forming part of a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern...

Claims

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Application Information

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IPC IPC(8): H05G2/00
CPCH05G2/006G03F7/70033H05G2/003H05G2/008
Inventor A·凯姆鹏E·鲁普斯特拉C·瓦格纳H·泰根博世G·斯温克尔斯
Owner ASML NETHERLANDS BV
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