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Method for preparing flexible anti-reflection layer with porous silicon as template

An anti-reflection layer and porous silicon technology, which is applied to electrical components, circuits, semiconductor devices, etc., can solve the problems of increased battery surface recombination, inability to form an anti-reflection layer, and surface damage of silicon cells. Reflective effect, good uniformity effect

Inactive Publication Date: 2016-08-17
SHANGHAI JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are obvious problems with the etching method, first of all, the compatibility of different materials. The wet etching method can etch an anti-reflection layer on single crystal silicon, but cannot form a good anti-reflection layer on polysilicon. At the same time, it is not suitable for flexible batteries; secondly, directly etching the anti-reflection structure on the battery will cause certain damage to the surface of the silicon battery, which may lead to an increase in the surface recombination of the battery; third, the tapered structure and the pyramidal shape The structure suffers from wavefront degradation

Method used

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  • Method for preparing flexible anti-reflection layer with porous silicon as template
  • Method for preparing flexible anti-reflection layer with porous silicon as template
  • Method for preparing flexible anti-reflection layer with porous silicon as template

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Embodiment 1

[0037] This embodiment relates to a method for preparing a flexible anti-reflection layer using porous silicon as a template. The method includes the following steps:

[0038] Step 1: Cut the PET into small pieces of 1.5×1.5cm, put them into a beaker, add an appropriate amount of absolute ethanol for ultrasonic cleaning for 5-10 minutes, pour out the absolute ethanol, add an appropriate amount of deionized water for ultrasonic cleaning for 5-10 minutes, Then take out the PET and dry it with ordinary nitrogen;

[0039] Step 2: Brush a layer of aliphatic amine solution on the surface of the PET. After the solvent is fully volatilized, put the PET on the turntable of the homogenizer, take WaterShed XC11122 photoresist (DSM of the Netherlands) and drop it on the surface of the PET. Shake off glue and dry.

[0040] Step 3, vapor-depositing perfluorooctyltrichlorosilane on the porous silicon template (resistivity 0.982Ω·cm);

[0041]Step 4, place the porous silicon template on the...

Embodiment 2

[0047] This embodiment relates to a method for preparing a flexible anti-reflection layer using porous silicon as a template. The method includes the following steps:

[0048] Step 1: Cut the PET into small pieces of 1.5×1.5cm, put them into a beaker, add an appropriate amount of absolute ethanol for ultrasonic cleaning for 5-10 minutes, pour out the absolute ethanol, add an appropriate amount of deionized water for ultrasonic cleaning for 5-10 minutes, Then take out the PET and dry it with ordinary nitrogen;

[0049] Step 2: Brush a layer of aliphatic amine solution on the surface of PET. After the solvent is fully volatilized, put the PET on the turntable of the homogenizer, take WaterShed XC11122 photoresist (DSM of the Netherlands) and drop it on the surface of PET. Shake off glue and dry.

[0050] Step 3, vapor-depositing perfluorooctyltrichlorosilane on a porous silicon template (with a resistivity of 0.008Ω·cm);

[0051] Step 4, place the porous silicon template on th...

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Abstract

The invention provides a method for preparing a flexible antireflection layer by utilizing porous silicon as a template. The method comprises the steps: firstly, shearing PET into small pieces, placing the shorn PET into a beaker, carrying out ultrasonic cleaning on the shorn PET with absolute ethyl alcohol, carrying out ultrasonic cleaning on the shorn PET with deionized water, taking out the PET and then drying the PET with common nitrogen gas; secondly, coating the surface of the PET with surface active agent solution, placing the PET on a rotary table of a spin coater after the solvent is fully volatilized, dripping photoresist on the surface of the PET, carrying out whirl coating and drying the PET; thirdly, evaporating the porous silicon template with a release agent; fourth, placing vacuum pressing equipment into an ultraviolet curing box and pressing the porous silicon template and the PET; fifth, carrying out ultraviolet radiation, solidifying the photoresist completely and cooling a sample to the indoor temperature; and sixth, stripping the four corners of the PET from the porous silicon template lightly, enabling the porous silicon template and the base of the PET to be separated, and then obtaining the flexible antireflection layer. The antireflection layer is good in antireflection effect and can lower the PET reflectivity by 80-95 percent.

Description

technical field [0001] The invention relates to a method for preparing an antireflection layer, in particular to a method for preparing a flexible antireflection layer using porous silicon as a template. Background technique [0002] With the advancement of modern technology, the scope of urbanization continues to expand, the demand for energy also increases, the amount of coal consumption continues to increase, and the increasingly serious environmental pollution problems and energy shortages caused by vehicle exhaust emissions are unavoidable. Alleviate pollution The problem is imperative. There are many kinds of clean energy that can be utilized, such as wind energy, thermal energy, nuclear energy and solar energy. As a clean and inexhaustible source of energy, solar energy has attracted worldwide attention since 1994. Although solar energy is a high-quality alternative energy source, the production cost of solar cells is relatively high, and the conversion efficiency o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L31/0216
CPCH01L31/02168H01L31/1804
Inventor 黄其煜郑一胄
Owner SHANGHAI JIAOTONG UNIV