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Optical interference color change pigment and its preparation method and application

An optical interference and color-changing pigment technology, which is applied in the fields of color-changing fluorescent materials, chemical instruments and methods, inorganic pigment processing, etc., can solve the problem of insufficient particle dispersion, inability to fully realize the expression of interference colors, and inability to fully utilize the reflected light from the surface of the flakes. And other issues

Inactive Publication Date: 2014-05-07
SHANGHAI NAT ENG RES CENT FORNANOTECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, wet chemical methods, such as sol-gel methods, cannot precisely control the thickness of each film layer in the angstrom range
In addition, the wet chemical method will cause the inherent smoothness of the surface of the sheet substrate to deteriorate, and the degree of dispersion of the particles is not sufficient, resulting in irregular reflections, which cannot fully utilize the reflected light on the sheet surface, and cannot fully realize the expression of interference colors

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Put the flake substrate mica (20-60 microns in size) into the attached powder sample attachment of the atomic layer deposition equipment, then place it in the reaction chamber, and evacuate to 10-16hPa. When the temperature of the reaction chamber reaches 150°C, the process of atomic layer deposition of zinc oxide layer (H layer) begins: the diethyl zinc precursor is injected into the reaction chamber with a pulse of high-purity nitrogen gas for 0.1 seconds, and is chemically adsorbed on the mica, and then passed through Inject high-purity nitrogen gas pulses for 3 seconds to clean the excess diethylzinc that is physically adsorbed on the substrate and in the reaction chamber; then inject water vapor pulses for 0.1 seconds to chemically adsorb to the first reaction substance, and then use high-purity nitrogen gas for 4 seconds Pulse to wash off excess water vapor. The above process completes one cycle of zinc oxide film deposition, and repeats the above process 271 time...

Embodiment 2

[0019] Put the flake substrate mica (20-60 microns in size) into the attached powder sample attachment of the atomic layer deposition equipment, then place it in the reaction chamber, and evacuate to 10-16hPa. When the temperature of the reaction chamber reaches 150°C, the process of atomic layer deposition of zinc oxide layer (H layer) begins: the diethyl zinc precursor is injected into the reaction chamber with a pulse of high-purity nitrogen gas for 0.1 seconds, and is chemically adsorbed on the mica, and then passed through Inject high-purity nitrogen gas pulses for 3 seconds to clean the excess diethylzinc that is physically adsorbed on the substrate and in the reaction chamber; then inject water vapor pulses for 0.1 seconds to chemically adsorb to the first reaction substance, and then use high-purity nitrogen gas for 4 seconds Pulse to wash off excess water vapor. The above process completes one cycle of zinc oxide film deposition, and repeats the above process 271 time...

Embodiment 3

[0021] Put the flake substrate mica (20-60 microns in size) into the attached powder sample attachment of the atomic layer deposition equipment, then place it in the reaction chamber, and evacuate to 10-16hPa. When the temperature of the reaction chamber reaches 150°C, the process of atomic layer deposition of titanium oxide layer (H layer) starts: the precursor of tetrakis(dimethylamine)titanium is injected into the reaction chamber with a pulse of high-purity nitrogen gas for 1 second, and is chemically adsorbed onto the mica , and then pass a 3-second high-purity nitrogen pulse to clean the excess tetrakis(dimethylamine)titanium in the reaction chamber that is physically adsorbed on the substrate; then pass a 0.1-second water vapor pulse to chemically adsorb to the first reaction substance, and then Purge off excess water vapor with a 4-second pulse of high-purity nitrogen. The above process completes one cycle of deposition of the titanium oxide film, repeating the above p...

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Abstract

The invention relates to a preparation method of an optical interference pigment, and characterized in that: by an atomic layer deposition technology, alternately depositing high refractive index and low refractive index multilayer oxide thin films on a sheet substrate, and by accurate adjustment and control of the refractive index and thickness of thin film materials, obtaining the optical interference pigment with the color changed with change of visual angles. The atomic layer deposition technology can guarantee the inherent smoothness of the sheet substrate surface, has excellent covering power, and full realizes the expression of optical interference color. The preparation method of the optical interference color change pigment is used in the industries of paints, coatings, plastics, ceramics, glass and cosmetics.

Description

technical field [0001] The invention designs a pigment and its preparation method and application, in particular relates to an optical interference color-changing pigment and its preparation method and application. Background technique [0002] Optical interference pigments are metal oxides or non-metallic oxides with high and low refractive indices alternately deposited on a flake substrate, using optical interference to produce colors, and can be used in paints, coatings, plastics, ceramics, glass, cosmetics and in the printing ink industry. The interference color of the pigment is determined by the optical refractive index and thickness of the oxide layer. If the refractive index and thickness of the film are not properly controlled, the interference pigment will reflect too much light in the entire visible light band, resulting in the phenomenon that the human eye feels very bright but has no color. Therefore, in order to control the color index of the film system, the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09C1/40C09C1/04C09C1/36C09C3/06C09K9/00
Inventor 姜来新尹桂林何丹农
Owner SHANGHAI NAT ENG RES CENT FORNANOTECH
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