Fine line preparation method
A line and fine technology, which is applied in the field of electron beam lithography and fine line preparation, can solve the problems of complex fine lines and increase process complexity, and achieve the effects of reducing roughness, improving stability, and reducing fluctuations
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[0020] The features and technical effects of the technical solution of the present invention will be described in detail below with reference to the accompanying drawings and in combination with exemplary embodiments. It should be pointed out that similar reference numerals represent similar structures, and the terms "first", "second", "upper", "lower", "thick", "thin" and the like used in this application can be used for Modify various device structures. These modifications do not imply a spatial, sequential or hierarchical relationship of the modified device structures unless specifically stated.
[0021] Reference attached figure 1 , shows a schematic diagram of an e-beam lithography layout for small linewidth features such as gate electrode layers, local interconnect layers, etc. In the present invention, the fine pattern FP is defined as a pattern that is beyond the capability of ordinary optical exposure and needs to be exposed by electron beams, and lines with a patte...
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