Laser lift-off method for flexible electronic application of sapphire substrate of gallium nitride LED
A sapphire substrate, laser lift-off technology, applied in circuits, electrical components, semiconductor devices, etc., can solve the problem of lack of chemical etchant for sapphire, and achieve the effect of a simple and fast method
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[0022] The principle of action of laser lift-off is based on the difference in bandgap between gallium nitride and sapphire. Sapphire has an optical bandgap of 8.7 eV, and GaN has an optical bandgap of 3.5 eV. Light with wavelengths between 143 nm and 354 nm will pass through sapphire but be absorbed by GaN. When light in this range is incident from the sapphire substrate, it will pass through the sapphire and be absorbed by the gallium nitride in the interface region to generate heat. If this light is emitted by a laser with high power and short action time, enough heat can be generated in the interface area to decompose gallium nitride into metal gallium and nitrogen, and because the laser action time is very short, the heat is too late to travel far. The decomposed GaN is only a few hundred nanometers thick near the interface and does not damage the core region of the GaN LED. After irradiation, the interface region will have only a layer of gallium metal left over from th...
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