Electric arc metal vapor concentration measuring system based on CCD (Charge-coupled Device) imaging
A technology for metal vapor and concentration measurement, which is applied in electric radiation detectors, color/spectral characteristic measurement, etc., can solve problems such as difficult direct contact measurement of arc metal vapor concentration, and achieve real-time dynamic measurement, clear and stable circle image, and measurement high precision effect
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[0034] An arc metal vapor concentration measurement system based on CCD imaging such as figure 1 As shown, it includes a synchronous trigger circuit, a dynamic pressure measurement module, an arc optical image acquisition and processing system, and a data processing unit (image acquisition card, special software system). The arc temperature is measured by using the optical radiation intensity of the characteristic wavelength, and further calculated. The arc plasma metal vapor concentration realizes the construction of the temperature field and the metal vapor concentration field of the three-dimensional asymmetric arc plasma, and realizes the display and storage of the results.
[0035] Synchronous triggering adopts active synchronous triggering, that is, after the computer executes the initialization program, while controlling the image acquisition card to start collecting, it also sends a signal to the measured object and each measuring device to trigger the work, that is, th...
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