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Electric arc metal vapor concentration measuring system based on CCD (Charge-coupled Device) imaging

A technology for metal vapor and concentration measurement, which is applied in electric radiation detectors, color/spectral characteristic measurement, etc., can solve problems such as difficult direct contact measurement of arc metal vapor concentration, and achieve real-time dynamic measurement, clear and stable circle image, and measurement high precision effect

Inactive Publication Date: 2014-06-18
CHINA ACADEMY OF SPACE TECHNOLOGY
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Problems solved by technology

[0009] The technical problem solved by the present invention is: to overcome the deficiencies of the prior art, to provide a CCD imaging-based arc metal vapor concentration measurement system, which solves the problem that the arc metal vapor concentration is difficult to measure directly, and has high measurement accuracy and reliability. Excellent dynamic response characteristics

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  • Electric arc metal vapor concentration measuring system based on CCD (Charge-coupled Device) imaging
  • Electric arc metal vapor concentration measuring system based on CCD (Charge-coupled Device) imaging
  • Electric arc metal vapor concentration measuring system based on CCD (Charge-coupled Device) imaging

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specific Embodiment approach

[0034] An arc metal vapor concentration measurement system based on CCD imaging such as figure 1 As shown, it includes a synchronous trigger circuit, a dynamic pressure measurement module, an arc optical image acquisition and processing system, and a data processing unit (image acquisition card, special software system). The arc temperature is measured by using the optical radiation intensity of the characteristic wavelength, and further calculated. The arc plasma metal vapor concentration realizes the construction of the temperature field and the metal vapor concentration field of the three-dimensional asymmetric arc plasma, and realizes the display and storage of the results.

[0035] Synchronous triggering adopts active synchronous triggering, that is, after the computer executes the initialization program, while controlling the image acquisition card to start collecting, it also sends a signal to the measured object and each measuring device to trigger the work, that is, th...

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Abstract

The invention discloses an electric arc metal vapor concentration measuring system based on CCD (Charge-coupled Device) imaging. The measuring system comprise a synchronous trigger circuit, a dynamic pressure measuring module, an electric arc optical image collecting and processing system and a data processing unit. According to the system, the CCD (Charge-coupled Device) imaging technique, the digital image processing technique and the radioactive spectrum temperature measuring technique are combined, the monotonous dependent relationship between an electric arc light radiation coefficient and a metal vapor concentration under certain temperature and air pressure is obtained by calculating; a three-dimensional radiation coefficient field of electric arc characteristic wavelengths is constructed through light radiation intensity measurement, and a three-dimensional metal vapor concentration field is obtained by virtue of reverse interpolation. The method conducts non-contact measurement and has the advantage of being strong in anti-interference capacity, high in measurement accuracy, free of interruption to an electric arc field and favorable for dynamic measurement in real time; by adopting a density-adjustable disc, power adjustment and saturation control of light radiation in real time are realized, the measuring accuracy of the metal vapor concentration is improved and the dynamic measuring scope is enlarged.

Description

technical field [0001] The invention relates to a measurement system and measurement method for the spatial distribution of arc ablation metal vapor concentration based on CCD imaging technology, which is especially suitable for arc plasma ablation metal in the fields of welding, painting, cutting, material processing, switching electrical appliances, space propulsion, etc. Non-contact measurement of three-dimensional field distribution of vapor concentration. Background technique [0002] Arc discharge is a gas self-sustaining discharge phenomenon that can exist independently. The plasma obtained by arc discharge is called arc plasma. In welding, machinery, materials, metallurgy, lighting, spraying, energy, aviation, aerospace and other engineering fields, arc discharge has a wide range of applications and has attracted great attention. These occasions mainly use the high temperature, high energy density, and Easy to control and so on. In particular, in aerospace, aerospa...

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Application Information

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IPC IPC(8): G01N21/25G01J5/20
Inventor 王伟宗于源李萌薛明王春野
Owner CHINA ACADEMY OF SPACE TECHNOLOGY
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