Production method of miniature amorphous silicon thin film solar cells
A technology for solar cells and amorphous silicon thin films, applied in the field of solar energy applications, can solve the problems of hindering the large-scale popularization and application of amorphous silicon thin film solar cells, low conversion efficiency, and high degree of attenuation
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[0037] The present embodiment relates to a kind of production method of miniature amorphous silicon thin-film solar cells, such as figure 1 As shown, the method includes the following steps:
[0038] A. Edge grinding and one-time cleaning of the conductive glass substrate. According to the predetermined line spacing of the production line, a laser scribing is performed on the TCO film layer on it, and the whole board is divided into several pieces, which are used as electrodes of several single cells.
[0039] B. After the second cleaning, preheat, and prepare a single-layer PIN battery film layer by PECVD on the TCO film layer; the details are as follows:
[0040] To prepare the P layer, use B(CH 3 ) 3 、SiH 4 、CH 4 、H 2 Gas, deposition temperature 178℃~182℃, power density 15~19mW / cm2, hydrogen dilution ratio R 23~35, flow ratio of silane to methane 10:1~1.35, deposition pressure 0.8Torr, film thickness 15~ 20nm;
[0041] To prepare layer I, use SiH 4 、H 2 gas, where ...
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