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Corrugated structure vanadium dioxide thin film and preparation method thereof

A technology of vanadium dioxide and thin film, which is applied in the field of vanadium dioxide thin film and its preparation, can solve the problem of low transmittance in the visible light region, and achieve the effect of simple preparation method and high repetition rate

Inactive Publication Date: 2016-04-20
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention is to solve the existing VO 2 In view of the technical problem of low transmittance of thin films in the visible light region, a method for preparing vanadium dioxide thin films with a corrugated structure is provided

Method used

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  • Corrugated structure vanadium dioxide thin film and preparation method thereof
  • Corrugated structure vanadium dioxide thin film and preparation method thereof
  • Corrugated structure vanadium dioxide thin film and preparation method thereof

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specific Embodiment approach 1

[0020] Embodiment 1: A vanadium dioxide film with a corrugated structure in this embodiment is composed of a substrate and a vanadium dioxide layer attached to the surface of the substrate, wherein the cross section of the vanadium dioxide layer is corrugated.

specific Embodiment approach 2

[0021] Embodiment 2: This embodiment is different from Embodiment 1 in that the substrate is glass, quartz or silicon. Others are the same as in the first embodiment.

specific Embodiment approach 3

[0022] Specific embodiment three: the preparation method of the corrugated structure vanadium dioxide film described in specific embodiment one is carried out according to the following steps:

[0023] 1. Preparation of V on the surface of the substrate by radio frequency magnetron sputtering 2 o 5 film;

[0024] Two, the V prepared in step one 2 o 5 The film is heat-treated to obtain VO 2 film;

[0025] Three, the VO 2 The film is sent to the ion beam sputtering chamber, and the vacuum is evacuated to a vacuum degree of 5.0×10 -4 ~9.0×10 -4 Pass argon gas after Pa to make the vacuum degree 2.0×10 -2 ~8.0×10 -2 Pa, VO 2 The temperature of the film is at room temperature, ion beam sputtering under the conditions of discharge voltage 60-70V, discharge current 0.1A, particle beam current voltage 0.8-1Kv, acceleration voltage 200-260V, acceleration current 2-4mA, filament current 6-8A Sputtering, sputtering time 20min ~ 40min, to obtain a corrugated vanadium dioxide fil...

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Abstract

The invention discloses a vanadium dioxide thin film with a corrugated structure and a preparation method thereof, relating to a vanadium dioxide thin film and a preparation method thereof. The vanadium dioxide thin film with the corrugated structure is used for solving the technical problem that an existing VO2 thin film has low transmittance in a visible light region, and consists of a substrate and a vanadium dioxide layer adhered to the surface of the substrate, wherein the surface morphology of the vanadium dioxide layer is corrugated. The preparation method comprises the steps of firstly, preparing a V2O5 thin film on the surface of the substrate by using a radio frequency magnetron sputtering method; secondly, performing heat treatment to change the V2O5 thin film into a VO2 thin film; finally, performing ion beam sputtering self-assembly to obtain the VO2 thin film with the corrugated structure. The vanadium dioxide thin film with the corrugated structure, disclosed by the invention, has the maximum transmittance close to 70% in the visible light region, and can be used as an intelligent window; moreover, the thin film has the characteristics of high repetition rate and simple method, and is suitable for industrial production.

Description

technical field [0001] The invention relates to a vanadium dioxide thin film and a preparation method thereof. Background technique [0002] Sunlight energy is an inexhaustible source of energy, of which 45% is visible light and 49% is infrared light. Due to the lag in the development of intelligent and controllable high-performance materials, the development and utilization of visible light is not very high, so To effectively discover a functional material that utilizes sunlight energy has become an urgent task in the development of new material technology. In addition, nearly 30-40% of the energy in today's society is used for building heating, cooling, ventilation and lighting, and the use of air conditioners is the most energy-consuming part. Indoor-outdoor energy exchange through glass is a key area for effective energy conservation, and coating thin-film materials on building glass to control the input of solar radiation under different conditions is an effective ener...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/08C23C14/58
Inventor 王锐张昱屾吴晓宏李杨仇兆忠
Owner HARBIN INST OF TECH