Method and system for purifying trichlorosilane from chlorosilane
A technology of trichlorosilane and chlorosilane, applied in the directions of halogenated silanes and halogenated silicon compounds, can solve the problems of large exhaust emission, large cooling loss, and more chlorosilanes, and achieves the goal of reducing emissions and realizing recycling. Effect
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[0089] Raw material composition:
[0090] Chlorosilane: trichlorosilane is about 85%, silicon tetrachloride is about 15%, dichlorodihydrosilane is about 0.1%, and the contents of various impurity elements are as follows: boron: 3500-4000ppbw, aluminum: 100-200ppbw, Calcium: 40-60 ppbw, phosphorus: 5500-6000 ppbw, titanium: 100-200 ppbw, iron: 100-150 ppbw.
[0091] Purification method:
[0092] Such as Figure 5As shown, the rectification space of the first rectification tower is heated by the heater of the first rectification tower 11, and then chlorosilane is added to the rectification space through the feed port, so that a large amount of dichlorodihydrosilane, boron The mixed gas of light components of phosphorus compounds and low-boiling impurities is discharged from the furnace top gas outlet, and then the mixed gas is condensed and separated through a condensation separator, so that dichlorodihydrosilane and trichlorosilane can be obtained respectively. The first rec...
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