A method for preparing functional monodisperse polyurea microspheres with high yield
A monodisperse and functional technology, applied in the field of preparing polymer monodisperse microspheres, can solve the problems of long polymerization time, cumbersome steps, low monomer content and microsphere yield, etc., and achieve short polymerization time and simple steps. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0006] Technical scheme of the present invention is as follows:
[0007] A method for preparing functional monodisperse polyurea microspheres with high yield, comprising the following steps:
[0008] Add water / acetonitrile mass ratio to the reaction flask as a mixed solvent of 10 / 90 to 30 / 70 and account for 5 to 30% of the total mass of the system isophorone diisocyanate (IPDI) monomer, seal the reaction flask and shake it The monomer and solvent are mixed evenly, then the reaction bottle is placed in a constant temperature water bath with a temperature of 20-70°C, and the polymerization reaction is carried out under static or shaking conditions for 1-3.5 hours; then the polymerization system is centrifuged, washed and dried. That is, monodisperse polyurea microspheres are obtained.
[0009] Preferably according to the present invention, the mass ratio of water / acetonitrile in the mixed solvent is 15 / 85˜30 / 70. The most preferred mass ratio of water / acetonitrile is 20 / 80.
...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
particle size | aaaaa | aaaaa |
particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com