Copper foil for printed wiring boards, laminates using the same, printed wiring boards, and electronic components
A technology for printed circuit boards and laminates, applied in the directions of printed circuit components, printed circuits, printed circuits, etc., can solve problems such as difficulty in dealing with circuit patterns and difficulty in operation
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[0069] Although examples of the present invention are shown below, they are provided for better understanding of the present invention and are not intended to limit the present invention.
[0070] (Example 1: Examples 1-2)
[0071] As the copper foil base material of Examples 1-2, the BHY process 18 micrometers thick rolled copper foil by JX Nikko Nippon Oil Metal Co., Ltd. was prepared. In this copper foil, the surface to be adhered to the resin is roughened, and the non-roughened surface is formed with a rustproof layer (Ni adhesion: 100μg / dm 2 , Zn adhesion amount: 300μg / dm 2 , Cr adhesion amount: 20μg / dm 2 ).
[0072] Next, after removing the antirust layer on the non-roughened surface by pickling, use Mo plating described in "(General Institution) Surface Technology Association, "Surface Technology", vol.155, No.8, p560-564" According to the following conditions, a MoNi alloy layer is formed on the non-roughened surface as a surface treatment layer. That is, first, g...
Embodiment 3~5)
[0078] As the copper foil base material of Examples 3-5, the BHY-processed 18-micrometer-thick rolled copper foil by JX Nippon Mining & Metals Co., Ltd. similar to Example 1 was prepared.
[0079] Next, after pre-processing the non-roughened surface by reverse sputtering, a Mo layer was formed by sputtering. The conditions of sputtering are shown below. The thickness of the surface treatment layer is controlled by adjusting the conveying speed, output, and Ar pressure.
[0080] ・Achieved vacuum degree: 1.0×10 -5 Pa
[0081] ・Sputtering pressure: Ar 0.2~0.4Pa
[0082] ・Sputtering power: 300~4000W
[0083] ・Copper foil conveying speed: 1-15m per minute
[0084] ・Target: Mo (3N).
[0085] Next, a CCL was produced by the procedure of Example 1, a resist pattern was formed on the Mo layer, and etching property evaluation, thermal discoloration resistance evaluation, and adhesion amount quantification were performed by the procedure of Example 1.
Embodiment 6~15)
[0087] As the copper foil base material of Examples 6-15, the BHY-processed 18 micrometer thick rolled copper foil by JX Nippon Mining & Metals Co., Ltd. similar to Example 1 was prepared.
[0088] Next, after pre-processing the non-roughened surface by reverse sputtering, a Mo layer was formed by sputtering, and NiV, Co, SnNi, ZnNi, and Cr layers were further formed by sputtering on the Mo layer. The conditions of sputtering are shown below. The thickness of the surface treatment layer is controlled by adjusting the conveying speed, output, and Ar pressure.
[0089] ・Achieved vacuum degree: 1.0×10 -5 Pa
[0090] ・Sputtering pressure: Ar 0.2~0.4Pa
[0091] ・Sputtering power: 300~4000W
[0092] ・Copper foil conveying speed: 1-15m per minute
[0093] ・Target: Mo, Ni, V, Co, Sn, Zn, Cr (3N).
[0094] Next, the thermal history of the hypothetical casting step (370°C×4h, N 2 atmosphere), make CCL.
[0095] Next, a resist pattern was formed on the surface-treated surface by ...
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