Device and method for deep removing water and carbon dioxide in nitrous oxide

Abstract

The invention discloses a device and method for deep removing water and carbon dioxide in nitrous oxide, and belongs to the technical field of chemical industry production. The device comprises a raw material bottle, a collecting bottle and adsorbing devices. The adsorbing devices include the 13X molecular sieve adsorbing device, the 5A molecular sieve adsorbing device, the modified molecular sieve adsorbing device and the 3A molecular sieve adsorbing device, wherein the 13X molecular sieve adsorbing device, the 5A molecular sieve adsorbing device, the modified molecular sieve adsorbing device and the 3A molecular sieve adsorbing device are sequentially connected. The raw material bottle is heated by a heating device on the outer side of the raw material bottle, a first pressure reducing device is opened when the pressure of raw gas in the raw material bottle reaches 2.0 MPa to 4.0 MPa, and the raw gas sequentially enters the molecular sieve adsorbing devices. When the pressure of the gas in the adsorbing devices reaches 2.0 MPa to 4.0 MPa, a second pressure reducing device is opened, and the gas with impurities removed through the adsorbing devices is collected into the collecting bottle, wherein a refrigerating device is arranged on the outer side of the collecting bottle. By means of the method, the adsorbing depth and the adsorbing speed of adsorbents are increased through high-pressure adsorption, the physical adsorbing function and the chemical reaction function are achieved by conducting chemical modification on molecular sieves, the adsorbing performance of the adsorbents is improved, the water impurity and the carbon dioxide impurity in the nitrous oxide are deep removed, and a high-purity nitrous oxide product is obtained.

Description

technical field [0001] The invention relates to a device and method for deep removal of water and carbon dioxide in nitrous oxide, belonging to the technical field of chemical production. Background technique [0002] Nitrous oxide (N 2 O) is commonly known as laughing gas, and its chemical name is nitrous oxide. In the production process of microelectronics and optoelectronic devices, from the growth of the chip to the packaging of the final device, almost every step and every link is inseparable from the electron gas. Therefore, the electron gas is called the "food" and "source" of semiconductor materials. . The performance of semiconductor devices depends to a large extent on the quality of the electron gas used. Every order of magnitude increase in the purity of the electron gas will greatly promote the leap in the quality of semiconductor devices. Since the quality of electronic gas determines the development of IC technology, and semiconductor devices are widely use...

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Problems solved by technology

[0003] Chinese Patent CN1827524A "Electronic Grade Laughing Gas Purification Process", this patent is to produce electronic grade laughing gas through chemical purification and molecular sieve purification, but the purification process working pressure It is 0.3-1.0MPa, which belongs to low-pressure adsorption. Under this process condition, the adsorption performance of the adsorbent cannot be improved

Moreover, the technical indicators of the products produced by this process do not mention the water as the key impurity in electronic-grade nitrous oxide. The carbon dioxide content is 2PPm, which is also at a relatively high level. Gas Nitrous Oxide" (GB / T 14600-2009) and the technical indicators of similar foreign products are quite different, and it has been unable to meet the purity requirements of the existing high-purity (electronic gas) nitrous oxide used in the electronics industry

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