Metal doped mesoporous silicon-based molecular sieve nanosphere and preparation method thereof
A technology of metal doping and molecular sieve, applied in the direction of crystalline aluminosilicate zeolite, etc., to achieve the effect of easy industrial production, safe operation and lower production cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0024] Example 1 Synthesis of zirconium-doped mesoporous silicon-based molecular sieve nanospheres
[0025]Ethyl orthosilicate is used as the silicon source, and zirconium n-propoxide is used as the zirconium source. Dilute 12g of concentrated ammonia water (25wt%) to 300g (pH=11.4) with deionized water, add 0.58g of CTAB, stir and dissolve in a 50°C water bath. Prepare ethanol solution A of ethyl orthosilicate with different concentrations and ethanol mixed solution B of ethyl orthosilicate and zirconium n-propoxide: the concentration of (Si) in A is 0.2mol L -1 , the concentration of (Si) in B is 1.0mol·L -1 (At the same time, B prepared three groups respectively, so that Zr / Si=0.025, 0.05, 0.1). Quickly add 5mL of solution A to the above mixture under stirring, seal the reactor, stir for 5 hours, open the reactor, add 5mL of solution B dropwise, continue stirring for 1 hour, stop stirring, and stand in a water bath at 50°C for 20 hours. The reaction mixture was separated...
Embodiment 2
[0026] Example 2 Effect of different molar ratios of CTAB on the synthesis of zirconium-doped mesoporous silicon-based molecular sieve nanospheres
[0027] Ethyl orthosilicate is used as the silicon source, and zirconium n-propoxide is used as the zirconium source. Dilute 12g of concentrated ammonia water (25wt%) to 300g (pH=11.4) with deionized water, add 0.50g, 0.58g, 0.70g of CTAB respectively, stir and dissolve in a 50°C water bath. Prepare ethanol solution A of ethyl orthosilicate with different concentrations and ethanol mixed solution B of ethyl orthosilicate and zirconium n-propoxide: the concentration of (Si) in A is 0.2mol L -1 , the concentration of (Si) in B is 1.0mol·L -1 ; Zr / Si=0.05 in B. Quickly add 5mL of solution A to the above mixture under stirring, seal the reactor, stir for 5 hours, open the reactor, add 5mL of solution B dropwise, continue stirring for 1 hour, stop stirring, and stand in a water bath at 50°C for 20 hours. The reaction mixture was cent...
Embodiment 3
[0028] Example 3 Different templates are used to synthesize titanium-doped mesoporous silicon-based molecular sieve nanospheres
[0029] Ethyl orthosilicate is used as the silicon source, and titanium tetrachloride is used as the titanium source. Dilute 12g of concentrated ammonia water (25wt%) to 300g (pH=11.4) with deionized water, add 0.42g of DTAC, 0.58g of CTAB, and 0.55g of STAC, and stir to dissolve in a 50°C water bath. Prepare ethanol solutions A of different concentrations of ethyl orthosilicate and ethanol mixed solution B of ethyl orthosilicate and titanium tetrachloride: the concentration of (Si) in A is 0.2mol L -1 , the concentration of (Si) in B is 1.0mol·L -1 ; Ti / Si=0.05 in B. Quickly add 5mL of solution A to the above mixture under stirring, seal the reactor, stir for 5 hours, open the reactor, add 5mL of solution B dropwise, continue stirring for 1 hour, stop stirring, and stand in a water bath at 50°C for 20 hours. The reaction mixture was separated by ...
PUM
Property | Measurement | Unit |
---|---|---|
Average particle size | aaaaa | aaaaa |
Specific surface area | aaaaa | aaaaa |
Mesopore diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com