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Method for manufacturing high-temperature-resisting black borosilicate glass

A technology of borosilicate glass and high temperature resistance, which is applied in the field of high temperature resistant black borosilicate glass prepared by magnetron sputtering technology, which can solve the problems of no particularly mature technology

Inactive Publication Date: 2015-02-11
宁波海燕新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of vacuum coating technology to deposit high-temperature resistant black PVD films on the surface of special-purpose borosilicate glass has not yet matured at home and abroad.

Method used

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  • Method for manufacturing high-temperature-resisting black borosilicate glass

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Experimental program
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Effect test

Embodiment 1

[0027] The invention provides a continuous sputtering coating equipment, the structure of the continuous sputtering coating equipment is as follows figure 1 As shown, it includes a conveyor belt 1 and four vacuum chambers, and the four vacuum chambers include a first pre-pumping chamber 3 , a first coating chamber 4 , a second coating chamber 5 and a second pre-pumping chamber 6 . The first pre-extraction chamber 3 is located in front of the first coating chamber 4, the first coating chamber 4 is adjacent to the second coating chamber 5, the second pre-extraction chamber 6 is located behind the second coating chamber 5, and the conveyor belt is in the first pre-extraction chamber. chamber, at least two coating chambers, and the second pre-pumping chamber are cyclically rotated to transport the borosilicate glass to be coated. In addition, a glass cleaning line 2 is provided for cleaning and air-drying the borosilicate glass to be coated. The glass cleaning line 2 is integrated...

Embodiment 2

[0050] Embodiment 2 provides a kind of continuous sputtering coating equipment, described continuous sputtering coating equipment except including all structures of embodiment 1, also comprises the 3rd coating room, the 3rd coating room is located in the second coating room 5 and the second Between 6 pre-pumping chambers.

[0051] Correspondingly, in the method for preparing high-temperature-resistant black borosilicate glass in Example 2, the borosilicate glass to be coated enters the third coating chamber for further coating treatment after the coating treatment in the second coating chamber 5, and then enters The second pre-pumping chamber 6. In Example 2, one of the TiAlN film or the silicon nitride film is respectively deposited in the first coating chamber to the third coating chamber. Silicon oxide thin film; method two: the first and second coating chambers deposit TiAlN thin films, and the third coating chamber deposits silicon nitride thin films; method three: the f...

Embodiment 3

[0053] Embodiment 3 provides a kind of continuous sputtering coating equipment, described continuous sputtering coating equipment except including all structures of embodiment 1, also comprises at least the 3rd coating room and the 4th coating room, at least the 3rd coating room and the 4th coating room The four coating chambers are located between the second coating chamber 5 and the second pre-pumping chamber 6 .

[0054] Correspondingly, in the method for preparing high-temperature-resistant black borosilicate glass in Example 3, the borosilicate glass to be coated enters at least the third coating chamber and the fourth coating chamber for further processing after the coating treatment in the second coating chamber 5. Coating treatment, and then enter the second pre-pumping chamber 6. In embodiment 3, each coating chamber deposits one of TiAlN film or silicon nitride film respectively. ...the coating chambers all deposit silicon nitride films; method 2: the first and seco...

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Abstract

The invention discloses a method for manufacturing high-temperature-resisting black borosilicate glass by adopting the continuous multi-cavity magnetron sputtering technology. According to the method, before being coated, the glass is cleaned up firstly; then, the glass is conveyed to a pre-vacuum chamber of a continuous type vacuum coating machine through a conveying device and then sequentially enters a plurality of sputtering coating chambers matched with large type titanium aluminum magnetic control targets and silicon targets later on; argon and nitrogen mixed gas is led into the coating chambers, the reactive sputtering gas ratio is adjusted, glow discharge characteristics of the magnetic control targets are modulated, a black TiAlN function thin film is deposited on the surface of the borosilicate glass in a reactive sputtering manner firstly; then, the glass enters the next vacuum chamber, and an SiN protection thin film is deposited in a reactive sputtering manner; and finally coated annealing treatment is carried out, internal stress of the thin film is further reduced, and the film-based interface combination force is improved. The method for manufacturing the high-temperature-resisting black borosilicate glass by vacuum coating can obviously improve the high-temperature resisting performance of the black borosilicate glass through design of a composite thin film, the black glass can bear the temperature of 600 DEG C, and the color of the glass is not changed.

Description

technical field [0001] The invention relates to a method and equipment for preparing glass, in particular to a method and equipment for preparing high-temperature-resistant black borosilicate glass using magnetron sputtering technology. Background technique [0002] Glass-ceramic is a material with excellent light, heat, electricity, mechanical properties and rich colors. As a structural material, photoelectric functional material and decorative material, glass-ceramic is widely used in the fields of construction, new energy, electronic information and high-end home appliances. Although glass-ceramic is widely used due to its characteristics, the high overall energy consumption of glass-ceramic production has always been a problem. Therefore, the industry is trying to find a glass that can replace glass-ceramic and produce low overall energy consumption. Material. [0003] Borosilicate glass is a material with a series of advantages such as low expansion rate, high tempera...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0036C23C14/568
Inventor 吴海忠李金龙
Owner 宁波海燕新材料有限公司
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