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Micro-mirror array control method for implementation of free illumination pupil

A technology of micro-mirror array and control method, which is applied in the micro-mirror control of free illumination light source in the lithography system, and in the field of pixel-type illumination pupils, which can solve problems such as improper initial value acquisition, algorithm efficiency reduction, and time occupation , to achieve the effect of high accuracy, fast optimization speed and fast positioning

Inactive Publication Date: 2015-02-25
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

In the above steps, the core is to write such a pupil optimization algorithm to solve the deflection angle matrix of the micromirror that produces the target light intensity. For a spot position, sometimes the initial value is not obtained properly, which will reduce the efficiency of the algorithm. Generally, it needs to iterate more than 4000 times to reach convergence, which takes up a lot of time

Method used

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  • Micro-mirror array control method for implementation of free illumination pupil
  • Micro-mirror array control method for implementation of free illumination pupil
  • Micro-mirror array control method for implementation of free illumination pupil

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Embodiment

[0077] For an illumination system with NA=1.35, after running the light source mask optimization calculation, if to form Figure 4 For the ring-like free lighting distribution shown in (a), the number of micro-mirror units required is N=100, the size of the mirror units is dx=dy=0.8mm, and the size of the target lighting surface is Φ=120mm. Figure 5 For the algorithm that the present invention adopts and the genetic algorithm convergence that adopts in the general literature compare, when given optimization threshold ε=0.05, as can be seen from the figure, the genetic algorithm needs more than 2000 times to reach convergence, the present invention adopts The algorithm can be achieved only less than 700 times, and the results show that the present invention is superior to intelligent algorithms such as genetic algorithm and simulated annealing in terms of convergence and average running time.

[0078] Image 6 , 7, 8 are the design results of annular lighting, four-level ligh...

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Abstract

The invention provides a micro-mirror array control method for implementation of a free illumination pupil. The method includes: limiting an initial value of deflection angle of each micro-mirror unit to a certain range so that reflected spots on a target face are close to a target light density distribution area; using differences between actual light intensity distribution of the target face and light intensity density of a target to be produced, as evaluation functions, and grouping the evaluation functions according to magnitudes of pixel values of points; keeping unchanged defection angle for each micro-mirror unit which corresponds to one point having the pixel value satisfying the convergence condition; calculating an optimal value of the defection angle of each micro-mirror unit which corresponds to each point which has the pixel value not satisfying the convergence condition, updating the evaluation functions, screening the points each having the pixel value not satisfying the convergence condition, and re-updating the optimal values until convergence. The method has the advantages that the drive voltage value of a micro-mirror array can be effectively returned fast, and quick switching of different illumination modes is achieved.

Description

technical field [0001] The invention belongs to the technical field of lithography resolution enhancement, and relates to a micro-reflector control method for realizing free illumination pupil, in particular to a micro-mirror control method for free illumination light source in a lithography system, which is used to realize light source masking. Film-optimized output of pixel-based illumination pupils. Background technique [0002] At present, large-scale integrated circuits (IC) are generally manufactured by lithography system. The lithography system mainly includes five parts: light source, illumination system, mask, projection system and wafer. The mask image is illuminated by the illumination system, and the projection objective lens An illuminated mask image is projected onto a photoresist-coated silicon wafer, thereby transferring the mask structure to the light-sensitive layer of the substrate. [0003] As the lithography technology node enters 45-22nm, the lithograp...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 邢莎莎林妩媚廖志杰邢廷文
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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