Method for preparing transparent conducting electrode based on 3D (three-dimensional) printing technique

Abstract

The invention relates to a method for preparing a transparent conducting electrode based on a 3D (three-dimensional) printing technique. The method is characterized by comprising the following steps of 1) providing a 3D printing device which comprises a collosol generation cavity, 3D printing heads and laser printing heads, 2) performing modeling: designing a model of the transparent conducting electrode by using computer modeling software and converting a software instruction of the model into a mechanical instruction of 3D printing, 3) preparing collosol: sequentially adding an inorganic metallic compound or organic metallic compound A and an organic solvent B to the collosol generation cavity to generate the collosol used for preparing the transparent conducting electrode, and 4) printing the transparent conducting electrode by using the 3D printing device, wherein the collosol generation cavity comprises a collosol generation cavity body and a stirring rod. The method effectively simplifies the complicated process of preparing the transparent conducting electrode in the prior art, increases the yield and the accuracy of the transparent conducting electrode, and lowers the preparation cost.

Description

technical field [0001] The invention relates to the field of manufacturing transparent conductive electrodes, in particular to a method for preparing transparent conductive electrodes based on 3D printing technology. Background technique [0002] Transparent conductive electrodes are widely used in fields such as flat panel displays, microdisplays, solar cells, and photodetectors, and are key components of optoelectronic devices. Currently, commonly used transparent conductive electrodes include: In 2 o 3 Thin films and their doping systems, SnO 2 Film and its doping system, SnO thin film and its doping system and Cd 2 o 4 film systems, etc. [0003] The main methods for preparing transparent conductive electrodes are vacuum physical method and chemical method. Among them, the vacuum physical method mainly refers to the magnetron sputtering method, which can prepare dense and uniform transparent conductive films with good physical adhesion, but has high requirements f...

AI Technical Summary

Problems solved by technology

Among them, the vacuum physical method mainly refers to the magnetron sputtering method, which can prepare dense and uniform transparent conductive films with good physical adhesion, but has high requirements for equipment and growth environment.

The chemical method is mainly the sol-gel method. The advantage of this method is that the production equipment is simple and it is easy to achieve uniform doping of multi-components. However, the physical adhesion between the conductive film and the substrate is poor and the high temperature treatment makes the substrate of the transparent conductive electrode tablets are restricted

For the preparation of patterned transparent conductive electrodes, tedious processes such as etching and developing are required.

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