Forming method of semiconductor structure
A semiconductor and graphic technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, transistors, etc., to improve performance and quality
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[0027] As mentioned in the background art, the performance of the storage units in the storage area of the embedded flash memory device still needs to be further improved.
[0028] Research has found that in the prior art, during the process of forming the storage unit of the embedded flash memory device, the top of the control gate of the storage unit is often damaged, resulting in the performance of the storage unit being affected.
[0029] Please refer to Figure 1 to Figure 5 It is a structural schematic diagram of a method for forming an embedded flash memory device in the prior art.
[0030] Please refer to figure 1 , providing a semiconductor substrate 10, the semiconductor substrate has a first region I and a second region II, the first region I is a logic region, and the second region II is a storage region. There is an isolation structure (not shown in the figure) between the first region I and the second region II. A gate dielectric layer material layer 11 is f...
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