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Light-transmitting conductive film and touch panel including light-transmitting conductive film

A light-transmitting, conductive film technology, applied to the conductive layer on the insulating carrier, electrical digital data processing, data processing input/output process, etc., can solve the problem that the light-transmitting conductive film is difficult to form patterns, etc., to achieve excellent Etching effect

Active Publication Date: 2016-04-27
SEKISUI NANO COAT TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a problem that it is difficult to form a pattern of a desired shape in a translucent conductive film that is difficult to etch by etching or is easily overetched.

Method used

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  • Light-transmitting conductive film and touch panel including light-transmitting conductive film
  • Light-transmitting conductive film and touch panel including light-transmitting conductive film
  • Light-transmitting conductive film and touch panel including light-transmitting conductive film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0158] Formation of 20nm SiO on a PET resin substrate with a thickness of 125μm 2 layer, and then form a 16nm indium tin oxide film. Specifically, using a sintered body material composed of indium oxide: 95% by weight and tin oxide: 5% by weight as a target, SiO was formed by DC magnetron sputtering. 2 layer on which a light-transmitting conductive layer is formed. It heat-processes in air|atmosphere, and finally obtains the translucent conductive film of this invention.

[0159] The translucent conductive layer was formed as follows. Vacuum the chamber to 3.0×10 -4 Below Pa, then introduce oxygen and argon into the chamber to make the oxygen partial pressure reach 4.5×10 -3 Pa, the pressure in the chamber is 0.2-0.3 Pa, and the film forming temperature is set at 50° C. for sputtering treatment.

[0160] Then, the film which heat-processed at 150 degreeC in air|atmosphere for 60 minutes was evaluated by XRD. The average value of the function f(α) is 1.07. In addition, t...

Embodiment 2

[0166] Formation of 20nm SiO on a PET resin substrate with a thickness of 125μm 2 layer, forming a 22nm indium tin oxide film. Other than that, it carried out similarly to Example 1, and obtained the translucent conductive film of this invention. As a result of evaluation by XRD, the average value of the function f(α) was 2.86.

Embodiment 3

[0168] Formation of 20nm SiO on a PET resin substrate with a thickness of 125μm 2 layer, forming a 28nm indium tin oxide film. Except for that, it carried out similarly to Example 1, and obtained the translucent conductive film of this invention. As a result of evaluation by XRD, the average value of the function f(α) was 4.15.

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Abstract

The present invention provides a translucent conductive film containing (A) a translucent support layer and (B) a translucent conductive layer containing indium oxide and having excellent etching properties. As a solution to the problem, a light-transmitting conductive film is provided, which contains: (A) a light-transmitting support layer containing a polymer resin, and (B) a light-transmitting conductive layer containing indium oxide, the light-transmitting The conductive layer (B) is provided on at least one side of the translucent support layer (A) directly or via other layers on the same layer, and is characterized in that: (Ibα-Ibα-0.025°) / (Iaα-Iaα The average value of the function f(α) represented by -0.025°) is 0.08 to 5.00.

Description

technical field [0001] The present invention relates to a translucent conductive film, its production method and its use. Background technique [0002] As the light-transmitting conductive film mounted on the touch panel, the following light-transmitting conductive film is often used. At least one side of a light-transmitting support layer made of polyester or the like is provided with a transparent film containing indium oxide directly or through another layer. Photoconductive layer. [0003] When forming a light-transmitting conductive film into an electrode such as a grid (so-called patterning), after the light-transmitting conductive film is provided, only a predetermined area of ​​the film is removed by chemical treatment, that is, a so-called etching process is performed. As a result, the formed Electrodes of desired shape. Therefore, there is a problem that it is difficult to form a pattern of a desired shape in a translucent conductive film that is difficult to etc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01B5/14B32B7/02B32B9/00G06F3/041
CPCG06F3/041G06F2203/04103H01B5/14
Inventor 滝泽守雄泽田石哲郎武藤胜纪田中治中谷康弘林秀树
Owner SEKISUI NANO COAT TECH