Forming agent with capability of shortening hydration time, water-resistance formed foil and forming method of water-resistance formed foil

A chemical conversion method and chemical conversion technology, which are applied in electrolytic coatings, surface reaction electrolytic coatings, electrolytic capacitors, etc., can solve the problems of difficult and stable control of the production process, poor ion configuration, and large consumption of phosphoric acid, and achieve stable and controllable production. , The effect of excellent product quality and low consumption of phosphoric acid

Active Publication Date: 2015-04-08
SICHUAN RIKE ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

And γ-Al 2 o 3 with γ’-Al 2 o 3 All belong to the cubic crystal system, the number of aluminum ions is the same, but the γ’-Al 2 o 3 The configuration of ions is not as good as that of γ-Al 2 o 3 Uniform and neat
Phosphorus-containing substances can inhibit γ’-Al 2 o 3 The formation of γ-Al 2 o 3 The amount of production, but the reaction is greatly affected by temperature and concentration, resulting in difficult stable control of the production process and large consumption of phosphoric acid

Method used

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  • Forming agent with capability of shortening hydration time, water-resistance formed foil and forming method of water-resistance formed foil
  • Forming agent with capability of shortening hydration time, water-resistance formed foil and forming method of water-resistance formed foil

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0054] The aluminum foil is sequentially subjected to A) first-level chemical formation, second-level chemical formation, third-level chemical formation, and fourth-level chemical formation; B) phosphoric acid treatment; C) heat treatment; D) post-chemical formation; E) post-treatment; treatment process parameters such as temperature , pressure, time, voltage, etc. are all parameters of conventional chemical formation methods; where:

[0055] The chemical conversion liquid used in the first stage chemical conversion includes the following raw materials in weight percentage: 0.35% ammonium adipate, 0.002% maleic acid, 0.003% sodium hypophosphite, 0.20% citric acid, and the rest is water.

[0056] The chemical conversion liquid used in the second-stage chemical conversion includes the following raw materials in weight percentage: 0.15% ammonium adipate, 0.001% maleic acid, 0.002% sodium hypophosphite, 0.15% citric acid, and the rest is water.

[0057] The chemical conversion liq...

Embodiment 2

[0060] The method of formation is the same as the method in Example 1, except that the first-level formation and the second-level formation are used for the formation liquid:

[0061] The chemical conversion liquid used in the first stage chemical conversion includes the following raw materials in weight percentage: 0.35% ammonium adipate, 0.0025% maleic acid, 0.003% sodium hypophosphite, 0.20% citric acid, and the rest is water.

[0062] The chemical conversion liquid used in the second-stage chemical conversion includes the following raw materials in weight percentage: 0.15% ammonium adipate, 0.001% maleic acid, 0.002% sodium hypophosphite, 0.15% citric acid, and the rest is water.

Embodiment 3

[0064] The method of formation is the same as the method in Example 1, except that the first-level formation and the second-level formation are used for the formation liquid:

[0065] The chemical conversion liquid used in the first stage chemical conversion includes the following raw materials in weight percentage: 0.35% ammonium adipate, 0.003% maleic acid, 0.003% sodium hypophosphite, 0.20% citric acid, and the rest is water.

[0066] The chemical conversion liquid used in the second-stage chemical conversion includes the following raw materials in weight percentage: 0.15% ammonium adipate, 0.001% maleic acid, 0.002% sodium hypophosphite, 0.15% citric acid, and the rest is water.

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Abstract

The invention belongs to the field of electronic processing and in particular relates to a forming agent with the capabilities of shortening hydration time and improving water resistance of a formed foil, a water-resistance formed foil and a forming method of the water-resistance formed foil. The invention provides a novel application of the forming agent prepared by utilizing maleic acid for improving the water resistance of the formed foil and shortening the hydration time and also purposes of increasing the electrostatic conversion rate and the flex conversion rate of the formed foil. The forming agent is prepared from the following raw material in percentage by weight: 0.001-0.004 percent of the maleic acid. According to the forming agent disclosed by the invention, by adding the maleic acid, the purposes of inhibiting generation of gamma'-Al2O3, increasing the production amount of gamma-Al2O3 and improving the water resistance of the formed foil are achieved; compared with the prior art, the forming agent is stable and controllable in production and low in consumption of phosphoric acid.

Description

technical field [0001] The invention belongs to the field of electronic processing, and in particular relates to a forming solution for shortening the hydration time, a water-resistant forming foil and a forming method thereof. Background technique [0002] Formed foil is mainly used in aluminum electrolytic capacitors. The formation process is to form a dense oxide film on the surface of high-purity aluminum as a non-conductive medium. [0003] The chemical formation process generally includes the following steps: the following steps: A) four-level chemical formation or five-level chemical formation, B) heat treatment, C) phosphoric acid treatment, D) post-chemical formation, E) post-treatment four-level or five-level chemical formation-heat treatment-repair chemical formation-phosphorus Treatment-repair formation, the four-level formation includes the first-level formation, the second-level formation, the third-level formation, and the fourth-level formation, and the fift...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D11/10C25D11/12H01G9/055
CPCC25D11/10C25D11/12H01G9/055
Inventor 李铁军涂长新蔡斌韩苏额沈向前施忠裕
Owner SICHUAN RIKE ELECTRONICS
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