The invention provides a surface treatment method of a CVD (
chemical vapor deposition) gas diffuser. The surface treatment method comprises the following steps: S1, shielding; s2, washing with water after
degreasing treatment; s3, washing after alkali
etching, washing with water after acid
pickling, and flushing; s4,
anodic oxidation is conducted, oxidation liquid
medicine comprises
ammonium adipate accounting for 1%-15% of the volume of an
anodic oxidation tank, an auxiliary agent accounting for 60%-90% of the volume of the
anodic oxidation tank and the balance pure water, the auxiliary agent comprises
diethylene glycol, the set
voltage is 300-480 V, the climbing time is 1-10 min, the
holding time is 3-10 min, and the temperature is 45-60 DEG C; s5, blow-
drying after cleaning; and S6, placing in a high-temperature and high-pressure steam cavity for
hydration reaction, setting the pressure to be 0.2-0.4 MPa, the temperature to be 100-170 DEG C, the
humidity to be 50-100% RH and the reaction time to be 1-2 hours, taking out after the reaction is finished, and cooling to
room temperature. The average
corrosion resistance time of the oxidation film obtained through the method in a
hydrochloric acid aqueous solution with the
mass fraction of 5% reaches 2600 seconds or above, and in addition, the
corrosion resistance
improvement rate which can be achieved in the prior art can be broken through through the arrangement of
hydration reaction conditions.