MEMS process based miniature packaged F-P pressure sensor and forming method
A pressure sensor, F-P technology, which is applied in fluid pressure measurement using optical methods, and measurement of the change force of optical properties of materials when they are stressed, can solve low detection sensitivity, difficulty in making microgrooves, and two F-P chambers. problems such as poor parallelism of each end face, to achieve high resolution, avoid detection accuracy and resolution reduction, and take into account the effect of measurement accuracy
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[0056] A schematic diagram of the structure of a micro-encapsulated F-P pressure sensor based on MEMS technology is shown in figure 1 As shown, the F-P pressure sensor mainly includes a F-P pressure-sensitive MEMS chip 1 and a collimated beam expanding optical fiber 2;
[0057] Wherein, the structure diagram of F-P pressure-sensitive MEMS chip 1 is as follows figure 2 As shown, the F-P pressure-sensitive MEMS chip 1 is composed of an SOI silicon wafer, a glass wafer 3 and a double-thrown silicon wafer 4;
[0058] The SOI silicon wafer includes a top layer of silicon 5, an intermediate oxide layer 6 and a bottom layer of silicon 7; wherein, the upper surface of the bottom layer of silicon 7 is deposited with an anti-reflection film 8 and a passivation layer 10; the lower surface of the bottom layer of silicon 7 is provided with an annular groove And the circular protrusion, the circular protrusion is located in the center of the annular groove, forming a "membrane-island" str...
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