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Boron-phosphorus low-crossing doping manufacturing process of solar cell

A solar cell and manufacturing process technology, applied in the direction of sustainable manufacturing/processing, circuits, electrical components, etc., to achieve the effects of improving efficiency, reducing process, and improving product efficiency

Inactive Publication Date: 2015-05-13
SUZHOU LAISHIDA NEW MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the most fatal weakness of screen printing is to solve the problem of cross-doping, so how to develop low (or no) cross-doping phosphorus and boron doped screen printing paste is a top priority

Method used

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  • Boron-phosphorus low-crossing doping manufacturing process of solar cell

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Experimental program
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Embodiment

[0025] like figure 1 As shown, a solar cell boron phosphorus low cross-doping manufacturing process includes the following steps:

[0026] S1. First, apply the boron dopant or phosphorus dopant to the surface of the solar silicon wafer, dry it and put it on the quartz boat. The method of coating can be screen printing coating or inkjet coating or other methods Coating film to the surface of solar silicon wafer;

[0027] S2. Put the quartz boat into the middle of the propeller slurry in the diffusion furnace with a set temperature of 400-800°C, and send it into the diffusion furnace at a speed of 0.5-1.5 m / min under the protection of nitrogen at a flow rate of 10-50 liters / min;

[0028] S3. At the set temperature, fill in 5-10% oxygen and keep the diffusion sample under this condition for 10-60 minutes;

[0029] S4, then raise the temperature to 850-950°C at a rate of 15°C per minute, and diffuse at high temperature for 20-60 minutes under the protection of nitrogen;

[0030...

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Abstract

The invention provides a boron-phosphorus low-crossing doping manufacturing process of a solar cell. The boron-phosphorus low-crossing doping manufacturing process comprises the following steps: 1 coating a boron doping agent or a phosphorus doping agent on the surface of a solar silicon wafer; drying the solar silicon wafer and putting the solar silicon wafer into a quartz boat; 2 putting the quartz boat into the middle of a propelling paddle of a diffusion furnace with the temperature of 400-800 DEG C and conveying the quartz boat into the diffusion furnace at the speed of 0.5m / min-1.5m / min under the protection of nitrogen gas at the flow of 10L / min-50L / min; 3 filling 5%-10% of oxygen at the pre-set temperature and keeping a diffusion sample under the condition for 10-60 minutes; 4 raising the temperature to 850-950 DEG C at the speed of 15 DEG C per minute and dispersing at a high temperature under the protection of the nitrogen gas for 20-60 minutes; and 5 cooling the temperature of the diffusion furnace to be lower than 800 DEG C at the speed of 5 DEG C per minute and discharging the sample. The boron-phosphorus low-crossing doping manufacturing process has crossed low boron doping or no phosphorus crossed doping so that a complicated design structure is formed by common diffusion; the process is simplified and the same doping performance is obtained under the same condition; the better doping surface homogeneity can be obtained and the doping depth is adjusted; the efficiency is improved; a stopping layer does not need to be subjected to an edge separation step and an edge cutting step, and the environmental pollution is reduced.

Description

technical field [0001] The invention relates to the field of photovoltaic products, in particular to a manufacturing process of boron-phosphorus low-cross-doping solar cells. Background technique [0002] With the growing photovoltaic industry and the rapid development of solar cell technology, the current production of solar cells mainly adopts gas-phase doping technology, but the current gas-phase doping technology is far from meeting the needs of advanced high-end solar cells. The reason is that gas-phase doping The technical production process is cumbersome and complicated, resulting in high production costs and large environmental pollution. Therefore, in recent years, the industry is actively starting to develop new alternative technologies, such as screen printing, inkjet coating, etc. However, the existing coating technology is not mature enough to solve the technical problem of cross-doping. [0003] In order to improve the above deficiencies, the industry has rec...

Claims

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Application Information

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IPC IPC(8): H01L31/18
CPCH01L21/228H01L31/18Y02P70/50
Inventor 周励贵袁秀娟周治贵
Owner SUZHOU LAISHIDA NEW MATERIAL TECH