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High-hardness high-dielectric constant cover plate with AR and AF functions

A technology with high dielectric constant and dielectric constant is applied in the field of flat panel display devices, which can solve the problems of expensive cost and complicated sapphire processing technology, and achieve the effect of improving sensitivity and anti-interference.

Inactive Publication Date: 2015-05-27
广东迪奥应用材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the sapphire cover plate that people are pursuing is recommended because of its good chemical stability, high dielectric constant and high hardness. However, due to the complicated processing technology of sapphire, the cost is expensive, and people have been struggling to find a situation with the same performance. Next, cheap alternatives

Method used

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  • High-hardness high-dielectric constant cover plate with AR and AF functions
  • High-hardness high-dielectric constant cover plate with AR and AF functions

Examples

Experimental program
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Effect test

Embodiment 1

[0022] see figure 1 , the structure of the cover plate of this embodiment is Si3N4 / SiC / DLC, the thickness of Si3N4 is between 40-50nm, the thickness of SiC is between 45-55nm, and the thickness of DLC is between 30-40nm, using continuous online magnetron Sputtering method, SiC and DLC layers use silicon target and graphite target respectively, the preparation temperature is normal temperature, Ar and N2 and CF4 gas are introduced to the working vacuum of 0.25Pa, the power density of the target is 2-3W / cm2, and the deposition rate is low The method is to coat tempered glass or other optical plastic substrates. The cover plate of this embodiment has AR and AF functions, the hardness is 32GPa, and the dielectric constant is 11.

Embodiment 2

[0024] see figure 2 , the cover plate structure of this embodiment is AlN / SiC / DLC, the thickness of AlN is between 30-50nm, the thickness of SiC is between 45-55nm, and the thickness of DLC is between 40-100nm. Continuous online magnetron and The method of multi-arc ion plating, AlN adopts aluminum target, SiC adopts silicon target, DLC adopts graphite target, the preparation temperature is normal temperature, feed Ar and N2 and use magnetron sputtering to prepare AlN, feed Ar and CH4 and use magnetron sputtering to prepare SiC, and Ar and CF4 use multi-arc ion plating method, working vacuum at 0.25Pa, target current at 20-40A, adopt low deposition rate method to coat toughened glass or other optical plastic substrates, adopt low deposition rate method Deposit the DLC film. The cover plate of this embodiment has AR and AF functions, the hardness is 35GPa, and the dielectric constant is 10.5.

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Abstract

The invention discloses a high-hardness high-dielectric constant cover plate with AR and AF functions. The cover plate is applied to industrial control touch screens, mobile phones, PDA, vehicle navigation or various mobile terminals. Sandwich film structures are sequentially deposited on base materials, wherein the base materials refer to tempered glass or other optical plastics, and the film structures which are sequentially deposited on the base materials refer to Si3N4 (or AlN) / SiC / DLC. The cover plate is directly deposited by adopting a PVD method, wherein the film layer thickness of the Si3N4 (or AlN) is between 30nm and 50nm, the film layer thickness of the SiC is between 45nm and 55nm, and the film layer thickness of DLC is between 30nm and 40nm. The cover plate consisting of the film structures has the anti-reflection and anti-fingerprint effects and has the performances of high hardness and high dielectric constant, and if the used base material refers to Corning tempered glass, the conventional sapphire glass cover plate can be replaced, and the production cost is reduced.

Description

technical field [0001] The invention belongs to the field of flat panel display devices, in particular to a cover plate with high hardness and high dielectric constant with AR and AF functions. Background technique [0002] Carbon is an element widely distributed in nature and exists in various forms, the common ones are graphite, amorphous carbon and diamond, and the popular diamond-like carbon (DLC) in recent years. Diamond-like carbon is a kind of metastable amorphous substance containing diamond structure (SP3 hybrid bond) and graphite structure (SP2 hybrid bond), and carbon atoms are mainly bonded by SP3 and SP2 hybridization. Diamond-like diamond film has almost the same properties as diamond, such as high hardness, wear resistance, high surface finish, high resistivity, excellent field emission performance, high light transmittance and chemical inertness, etc. Its products are widely used in machinery , electronics, microelectromechanical systems (MEMS), optics, and ...

Claims

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Application Information

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IPC IPC(8): B32B9/04C23C14/06
Inventor 黄华凛苗蕾唐郭强张道强柳锡运呈浩亮
Owner 广东迪奥应用材料科技有限公司
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