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Method for preparing component oscillatory metal nitride coating
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A technology of nitrides and metals, which is applied in the field of preparation of composition oscillation metal nitride coatings, and can solve problems such as undiscovered coating technologies
Inactive Publication Date: 2015-06-03
SICHUAN UNIV +1
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Problems solved by technology
However, so far, no coating technology that can integrate these two structural design technologies has been found, so as to obtain a coating with dual composite structure characteristics of gradient and multilayer
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Embodiment 1
[0027] Deposition of a composition oscillating TiN coating on a Si wafer consists of the following steps:
[0029] The geometric dimensions of the Si substrate sample are: length 2cm×width 2cm. First, place the Si substrate in an ultrasonic vessel for cleaning with acetone and ethanol for 10 minutes each, and then dry it after cleaning; finally, place the Si substrate in a vacuum chamber for plasma bias backsplash cleaning. The process parameters are: background vacuum 9.5×10 -4 Pa, the backsplash bias voltage is -600V, the working gas is Ar gas, the backsplash pressure is 1.8Pa, and the cleaning time is 10min.
[0030] (2) Preparation of composition oscillating TiN coating
[0031] Use the QX-500 ultra-high vacuum multi-target magnetron sputtering coating machine to deposit the component oscillating TiN coating on the surface of the Si substrate, when the background vacuum degree of the vacuum chamber is less than 1×10 -3 Pa, Ar ga...
Embodiment 2
[0037] Since the coating structure may be affected by N 2 The influence of the content ratio of Ar gas and Ar gas on the maximum value. In this example, different N 2 The composition of the content ratio of Ar gas to Ar gas oscillates the TiN coating. Compared with Example 1, there are differences in the following process conditions:
[0038] (1) Different from Example 1, adjust N 2 The gas flow rate varies from 0 to 100 sccm, and the Ar gas flow rate remains unchanged at 150 sccm, so that the N 2 The content ratio of gas to Ar gas has a minimum value of 0 and a maximum value of about 0.7.
[0039] Except for the above, other process parameters are the same. Adopt the same coating structure testing method as in Example 1. The results show that the composition oscillating TiN coating prepared in this example also has the dual composite structure characteristics of gradient and multilayer.
Embodiment 3
[0041] Since the coating structure may be affected by N 2The effect of the number of cycles and the size of the cycle on the curve of the content ratio of Ar gas to Ar gas. The composition of this example shakes the TiN coating. Compared with Example 1, there are differences in the following process conditions:
[0042] (1) The difference from Example 1 is that adjusting N 2 The cycle number and cycle size of the curve of the content ratio of Ar gas and Ar gas are 40 and 5 min, respectively.
[0043] Except for the above, other process parameters are the same. Adopt the same coating structure testing method as in Example 1. The results show that the composition oscillating TiN coating prepared in this example also has the dual composite structure characteristics of gradient and multilayer.
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Abstract
The invention belongs to the application of surface engineering technology and particularly relates to a method for preparing component oscillatory metalnitridecoating. The method comprises the following steps: depositing component oscillatory metalnitridecoating on a substrate surface via a reactive sputtering process mode on a substrate cleaned by plasma bias backwash cleaning and having a smooth surface, wherein in the deposition process, the fractional flow or fractional pressure of N2 gas or Ar gas is changed to control the content ratio of the N2 gas to the Ar gas in the sputtering gas, and the change curve of the content ratio of the N2 gas to the Ar gas represents a periodic change rule with the coating deposition time. The distribution of the content ratio of an N element in the coating prepared by the method provided by the invention along the coating growth direction has an oscillatory characteristic; the coating is of a multilayer structure which is composed of a plurality of sub-layers, the change of the content ratio of the N element in each sub-layer represents a gradient distribution characteristic, and the coating has a dual gradient and multilayer composite structure characteristic.
Description
technical field [0001] The invention belongs to the application of surface engineering technology, in particular to a preparation method of a composition oscillation metalnitride coating. Background technique [0002] Coating technology is one of the material surface modification technologies that are widely concerned by the scientific and engineering communities. Coating on the surface of the material can make the material have high temperature resistance, corrosion resistance, wear resistance, fatigue resistance, radiation protection, electrical conductivity and magnetic conductivity, etc., making it work in high speed, high temperature, high pressure, heavy load or corrosive medium environment The device components can have better service performance, enhance reliability and prolong service life. At present, from the classification of material structure characteristics, it can be mainly divided into coating materials with three structural systems: single-layer homogeneo...
Claims
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